Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 16 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Systems and methods for unchoked control of gas turbine fuel gas control valves
Uplink synchronization management in wireless networks
Method for fabricating solar cell
Devices and methods for the production of coaxial microfibers and nanofibers
Positive electrode active material for nonaqueous electrolyte secondary battery
Spalling utilizing stressor layer portions
Method for improving the performance of browser-based, formula-driven parametric objects
  Randomly Featured Patents
Polysilicon-collector-on-insulator polysilicon-emitter bipolar transistor
Methods for constructing ice structures
Continuous flow air dryer with double helix split desiccant bed
Metallocorrinoids as biologically compatible carriers of pharmacological agents
Machine control using register construct
Valve nozzle for injection molding
Simulated crab lure
Medical assembly
Optical reticle inspection system and method
Highly efficient line transient protection circuit for high power loads