Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 16 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Epilation apparatus
IR(voltage) drop analysis in integrated circuit timing
Method and apparatus for verifiable generation of public keys
Distributed mobile access point acquisition
Mobile communication apparatus
Dynamic facsimile transcoding in a unified messaging platform
  Randomly Featured Patents
Using an access key to protect and point to regions in windows for infiniband
Hydraulic power management system
Method and apparatus for boxing and encapsulating electrical devices
Providing lubricant to an engine
Drainage catheter with visual indicator and/or lock system
Switch apparatus and network system
Poppet valve seat for an integrated pressure management apparatus
Stepping motor drive unit
Cigar holder and burn rate controller
Software training system