Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 16 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Downhole telemetry system
Telecommunications system and method
Method for manufacturing and reoxidizing a TiN/Ta.sub.2O.sub.5/TiN capacitor
Ultra-wideband communication system and method
Signal judgment method, signal judgment apparatus, program, and signal judgment system
Method of making a low-Rdson vertical power MOSFET device
Systems and methods for classifying electronic information using advanced active learning techniques
  Randomly Featured Patents
Microwave electron gun
Diode connector
Pulse-echo ranging system
Cable tap assembly
Lithium tantalate based X-ray intensifying screen
Method and apparatus for implementing leaf node proxy in a network
Combination pool and sandbox
Connector device for enteral administration set
Anode and lithium battery including the anode
Structure for attaching interior trim panel around automotive front pillar