Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 16 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Implantable device
Shared system to operationally connect logic nodes
Base station, relay station, and bandwidth allocation method
Rotation angle sensor
Reframing circuitry with virtual container drop and insert functionality to support circuit emulation protocols
Operation controlling apparatus
Washing machine
  Randomly Featured Patents
LCD monitor
Fastener tool
Bus checking device and bus checking method
High-frequency heating apparatus with steam generating function and water supply controlling method therefor
Driving circuit for a sound outputting apparatus
Connector position assurance device
Magnetoresistive head for reading magnetic ink characters
Container overcap with drying agent layer
Method to improve the performance of low-NOx burners operating on difficult to stabilize coals
Apparatus for the evaluation of yarn qualities