Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 13 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
String changing tool with a quick connector assembly and worm gear string cutter
Display module
Generating a network map
Method and system of a sensor interface having dynamic automatic gain control
Circuit board having semiconductor chip embedded therein
Methods and apparatus for processing audio signals
Conversion of 5-(chloromethyl)-2-furaldehyde into 5-methyl-2-furoic acid and derivatives thereof
  Randomly Featured Patents
Branch prediction method, arithmetic and logic unit, and information processing apparatus for performing brach prediction at the time of occurrence of a branch instruction
Fuels blending system and method of using
Ball dropping assembly
Rotational variable torque damper for a seat assembly for a vehicle
Switching network with a crosstalk elimination capability
Coal extraction
Amino derivatives of EM-138 and methods of treating angiogenesis with same
Lighting system with baffle
Resonant converter
Process for the preparation of cyclopropylcyanide