Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 13 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Image pickup apparatus
Protocol stack power optimization for wireless communications devices
Combined floating point adder and subtractor
Ring-based network and construction thereof
Lithium-ion secondary battery
Reflective strip
Stator manufacturing method for a motor and a stator manufactured using the same
  Randomly Featured Patents
Soluble salts of ibuprofen and naproxen with N-(2-hydroxyethyl) pyrrolidine and pharmaceutic compositions containing said salts
Acoustic inspection of one-piece bladed wheels
Method of depositing an amorphous carbon film for etch hardmask application
Wireless guitar transmitter
Optical disc reproducing apparatus
Apparatus for detection of and discrimination between tachycardia and fibrillation and for treatment of both
Sound producing straw
Focus state detection device
Method and arrangement for reducing the number of handoff requests in a cellular mobile communications system
Organic electroluminescent device and making method