Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 13 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Aircraft drive
Interface circuit and interface system
Automatic fixup of network configuration on system image move
Messenger bag
Phase locking loop
Method for controlling operation of a wind turbine
Method and device for operating a vehicle having a hybrid drive
  Randomly Featured Patents
Chuck and rotary orienting device
Regulator with integratable pulse drive signal
Method of controlling glass fiber formation and control system
Computer monitoring and testing of automatic control system
Integrating aspect oriented programming into the application server
Ultrasonic operation system
Process for the formation of phosphosilicate glass coating
Snap-lock mechanism for high-g platform
Developing apparatus
Tilting exercise bed actuated by a linear electromechanical device