Resources Contact Us Home
Laser irradiation method, laser irradiation apparatus, and semiconductor device

Image Number 13 for United States Patent #7095762.

An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

  Recently Added Patents
Managing aging of silicon in an integrated circuit device
PVD coated tool
Control apparatus and control method
Subcarrier cluster-based power control in wireless communications
Programming of DIMM termination resistance values
Method of fabricating crystal unit, crystal unit fabrication mask, and crystal unit package
Device, system, and method for logging near field communications tag interactions
  Randomly Featured Patents
Battery pack comprising hollow portion and power tool using the same
Electrooptical system
Elevator group control for the immediate assignment of destination calls
Ring switchover method
Article with non-stick finish and improved scratch resistance
Mesomorphic compound, liquid crystal composition, liquid crystal device, display apparatus and display method
Safety guard for patio heater
Shampoo bowl shower head
System for collecting data from meters placed at remote places