Resources Contact Us Home
Method of manufacturing dielectric isolated silicon structure

Image Number 2 for United States Patent #7067387.

A method for fabricating dielectric isolated silicon islands or regions is described in this invention. A hard composite mask of pad oxide and silicon nitride is first patterned on a silicon substrate and trenches of required dimensions are etched into silicon. After forming an oxide liner on trench surfaces, boron ions are implanted in areas around the trenches such that heavily doped p.sup.+ regions are formed. The oxide liner is anisotropically etched with a reactive ion etching process such that only the silicon surface at trench bottom is exposed, leaving the oxide liner on trench walls. Epitaxial silicon is then deposited selectively on exposed single crystal silicon surface so as to fill the trenches. After removing the hard mask, trenches are masked with photo-resist pattern and the wafer is anodically etched in an aqueous bath of HF to form a buried porous silicon layer under and around the trenches. After removing the mask, the porous silicon is then oxidized. Discrete silicon regions, electrically isolated by silicon dioxide, are then formed after removing the top oxide film on the epitaxial silicon surface.

  Recently Added Patents
Image processing apparatus, control method for the same, and storage medium
Cis-alkoxy-substituted spirocyclic 1-H-pyrrolidine-2,4-dione derivatives
Controller with screen
Electronic multiparty accounts receivable and accounts payable system
Control system for shifting an automatic transmission
Polyureas made from aminocrotonates and enaminones
Storing a location within metadata of visual media
  Randomly Featured Patents
Planar optical devices and methods for their manufacture
Faraday imaging at high temperatures
Exhaust gas purifying apparatus and method for a hybrid car
Die assembly for use in forging operation
Method of treating endothelial dysfunction comprising administration of a thrombin peptide derivative
Method of concentrating ozone gas and apparatus therefor
Plate-type ozone generator
Controlled relay of media streams across network perimeters
Bearing retainer
Edge control for calender covering industrial belting