Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of manufacturing semiconductor device and method of forming pattern










Image Number 6 for United States Patent #7060635.

The present invention provides a method of manufacturing a semiconductor device which includes a step of forming a laminated film for pattern formation on a substrate, in which the laminated film for pattern formation includes an innermost layer, an inner layer and a surface layer, an extinction coefficient k of the innermost layer is 0.3 or more, and an extinction coefficient k of the inner layer is 0.12 or more. It also provides a method of forming a pattern which includes a step of forming a laminated film for pattern formation on a substrate, in which the laminated film for pattern formation includes an innermost layer, an inner layer and a surface layer, an extinction coefficient k of the innermost layer is 0.3 or more, and an extinction coefficient k of the inner layer is 0.12 or more.








 
 
  Recently Added Patents
Block copolymer nanoparticle compositions
Motor device and method of manufacturing the same
Color imaging device
Nanofibers containing latent reactive groups
Image processing apparatus, image printing apparatus and printing data generation method
Software execution management apparatus, method, and computer-readable medium thereof
Substituted indolo 4,3 FG quinolines useful for treating migraine
  Randomly Featured Patents
Duplex printer
Method and apparatus for pixel display and SERS analysis
Fluid control of metering assemblies
System for controlling power on a mobile station and supporting method and apparatus
High performance digital ignition system for internal combustion engines
Modification of xylanase to improve thermophilicity, alkalophilicity and thermostability
Integrated circuit package via
Microwave oven
Tool box combination
Low k and ultra low k SiCOH dielectric films and methods to form the same