Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Failure diagnosis apparatus for temperature sensor










Image Number 11 for United States Patent #6980904.

A failure diagnosis apparatus for a temperature sensor which detects a temperature that changes depending on an operating condition of an internal combustion engine. Determining that the temperature sensor fails, if the execution condition of the failure determination is satisfied and a temperature difference between the maximum temperature and the minimum temperature detected by the temperature sensor in the determination period, is less than a failure determination threshold value, when the starting of the engine in the preceding engine operation cycle was a cold start. Alternatively, determining that the temperature sensor fails, if the execution condition is satisfied, the temperature difference between the maximum temperature and the minimum temperature is less than the failure determination threshold value, and an engine stop period in the preceding engine operation cycle is longer than a failure determination permission time period, when the starting of the engine in the preceding engine operation cycle was not a cold start.








 
 
  Recently Added Patents
Tractor
Voltage regulators with improved wake-up response
Biomedical electro-stimulator
Receiving security risk feedback from linked contacts due to a user's system actions and behaviors
Managing method and apparatus for servicing contents provided by content provider
Capacitance sensing
High pressure refolding of protein aggregates and inclusion bodies
  Randomly Featured Patents
Method for fracturing subterranean formations
Flat panel monitor stand base
Inductor
Image display device
Selective zeolitic adsorbent and a method for activation thereof
Outboard motor carrier
Transmitter apparatus and communication system employing the same
Method for making asymmetrical gate oxide thickness in channel MOSFET region
Machine robot, particularly for welding
Method of etching a wafer layer using multiple layers of the same photoresistant material