Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Plasma processing apparatus










Image Number 6 for United States Patent #6949165.

An electrical connection means 45 guides a DC voltage, which is generated in an ion sheath when a plasma is excited, to a first electrode 31 where a substrate W is placed. Hence, the DC voltage is applied to both the upper and lower surfaces of the substrate W, so the two surfaces of the substrate have the same potential. As a result, element breakdown, which occurs when a large potential difference occurs between the two surfaces of the substrate W, can be prevented.








 
 
  Recently Added Patents
Optical sensor and electronic apparatus
(4939
Collaborative system for capture and reuse of software application knowledge and a method of realizing same
Interconnecting virtual domains
Active constant power supply apparatus
Reliable and accurate usage detection of a software application
Apparatus and method for image reconstruction and CT system
  Randomly Featured Patents
Ball and socket 3D cushioning system
Methods and apparatus for performing therapeutic procedures in the spine
Quick change fastener system for attaching liner bracket to convergent flap and seal in turbine nozzle
Toilet training system
Minimally invasive mitral valve repair method and apparatus
Heteroaryl-substituted alkyne compounds and method of use
Rate multiplication method
Plastic films with surface anti-fog properties
Air bleed apparatus for a burner unit
Fixing device controlling method, fixing device, and image forming apparatus for forming fixed images of desired glossiness