Resources Contact Us Home
Methods for patterning using liquid embossing

Image Number 4 for United States Patent #6936181.

The current invention is directed to a method of patterning a surface or layer in the fabrication of a micro-device. In accordance with a preferred embodiment of the invention, a first mask structure is formed by depositing a layer of a first material onto the surface or layer and embossing the layer with a micro-stamp structure. The layer is preferably embossed as a liquid, which is solidified or cured to form the first mask structure. The first mask structure can be used as an etch-stop mask which is removed in a subsequent processing step or, alternatively, the first mask structure can remain a functional layer of the micro-device. In further embodiments, unmasked regions of the surface or layer are chemically treated through the first mask structure and/or a second material is deposited onto the unmasked regions of the surface or layer through the first mask structure to form a second mask structure and/or a second functional layer of the micro-device.

  Recently Added Patents
Wine cellar alarm system
Methods and systems for detecting icing conditions
Methods and system for providing drug pricing information from multiple pharmacy benefit managers (PBMs)
Pharmaceutical dosage form
Biodegradable aliphatic-aromatic copolyester for use in nonwoven webs
Push mechanism for efficiently sending aggregated data items to client
Use of cocoa extract
  Randomly Featured Patents
Picture image forming equipment
Shoe having a skelton-shaped outer carapace
Soybean event DP-305423-1 and compositions and methods for the identification and/or detection thereof
Apparatus and method for detecting a fetal heart rate
Concentric camshaft with bearing sleeve and method of debris removal
Herbicidal ortho-(azinyl)-benzenesulfonamides
Marking based on chiral liquid crystal polymers
Purification of fluids with nanomaterials
Tile edging strip
Floppy disk controller with means to change clock rate automatically