Resources Contact Us Home
Methods for patterning using liquid embossing

Image Number 4 for United States Patent #6936181.

The current invention is directed to a method of patterning a surface or layer in the fabrication of a micro-device. In accordance with a preferred embodiment of the invention, a first mask structure is formed by depositing a layer of a first material onto the surface or layer and embossing the layer with a micro-stamp structure. The layer is preferably embossed as a liquid, which is solidified or cured to form the first mask structure. The first mask structure can be used as an etch-stop mask which is removed in a subsequent processing step or, alternatively, the first mask structure can remain a functional layer of the micro-device. In further embodiments, unmasked regions of the surface or layer are chemically treated through the first mask structure and/or a second material is deposited onto the unmasked regions of the surface or layer through the first mask structure to form a second mask structure and/or a second functional layer of the micro-device.

  Recently Added Patents
SRB enhancement on HS-DSCH during cell change
Semiconductor device
Apparatus for touch screen avionic device
Multiplanar image displays and media formatted to provide 3D imagery without 3D glasses
Video editing apparatus
Organic light emitting display device and method of manufacturing the same
  Randomly Featured Patents
Method of manufacturing an oilwell swab cup
Water closet
Feeding device and process and feeding system which utilize the feeding device
Apparatus and method for internal combustion engine control
Image processing apparatus which thins out predetermined color signals
Water leak detection
Garden bench with straight back
Semiconductor testing equipment with probe formed on a cantilever of a substrate
Quick change tooling for press machine
Medical implant having improved drug eluting features