Resources Contact Us Home
Method of monitoring an exposure process

Image Number 6 for United States Patent #6929892.

In monitoring of an exposure process, a highly isolative pattern greatly changed in a shape of cross section by fluctuations in the exposure dose and the focal position is an observation target. Especially, to detect a change in a resist shape of cross section from a tapered profile to an inverse tapered profile, one of the following observation methods is employed to obtain observation data: (1) a tilt image of a resist pattern is imaged by using tilt imaging electron microscopy, (2) an electron beam image of a resist pattern is imaged under imaging conditions for generating asymmetry on an electron beam signal waveform, and (3) scattering characteristic data of a resist pattern is obtained by an optical measurement system. The observation data is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position.

  Recently Added Patents
Light-sensing apparatus having a conductive light-shielding film on a light-incident surface of a switch transistor and method of driving the same
Battery cartridge and battery module containing the same
System and method for adjusting a boundary for a machine
Multiple-junction photoelectric device and its production process
System and method for processing and/or analyzing OLAP based data according to one or more parameters
Coating device and coating method
  Randomly Featured Patents
Fabrication method of graded index silica glass
Analog current command and settable slopes in voltage regulator
Method and device in particular for packaging flat objects
Apparatus for preventing an outflow of a fuel within a fuel tank of a vehicle
Medicinal container with surface ornamentation
Semiconductor component with increased dielectric strength and/or reduced on resistance
Hydro-pneumatic singulation of gel-encapsulated propagules
Step stool
Electronic apparatus
High porosity three-dimensional structures in chromium based alloys