Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of monitoring an exposure process










Image Number 6 for United States Patent #6929892.

In monitoring of an exposure process, a highly isolative pattern greatly changed in a shape of cross section by fluctuations in the exposure dose and the focal position is an observation target. Especially, to detect a change in a resist shape of cross section from a tapered profile to an inverse tapered profile, one of the following observation methods is employed to obtain observation data: (1) a tilt image of a resist pattern is imaged by using tilt imaging electron microscopy, (2) an electron beam image of a resist pattern is imaged under imaging conditions for generating asymmetry on an electron beam signal waveform, and (3) scattering characteristic data of a resist pattern is obtained by an optical measurement system. The observation data is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position.








 
 
  Recently Added Patents
Aisle barrier
Cooling structure for electronic device
Display screen with graphical user interface
Modular sport center
Encryption using alternate authentication key
Methods of saccharification of polysaccharides in plants
(4930
  Randomly Featured Patents
Method and apparatus for continuous peritoneal cascade dialysis and hemofiltration (CPCD/H)
Coaxial cable connection protection system for unused connection port
Method and apparatus for top heat bake assist in a gas oven appliance
Hoisting fitting for removable truck containers
Surgical clip applier
Refuse collection apparatus and method
Tire tread
Prevention of looping and duplicate frame delivery in a network environment
Leuco dyes and recording material employing the same
Semi-permanent enclosure for optical data storage device