Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of monitoring an exposure process










Image Number 6 for United States Patent #6929892.

In monitoring of an exposure process, a highly isolative pattern greatly changed in a shape of cross section by fluctuations in the exposure dose and the focal position is an observation target. Especially, to detect a change in a resist shape of cross section from a tapered profile to an inverse tapered profile, one of the following observation methods is employed to obtain observation data: (1) a tilt image of a resist pattern is imaged by using tilt imaging electron microscopy, (2) an electron beam image of a resist pattern is imaged under imaging conditions for generating asymmetry on an electron beam signal waveform, and (3) scattering characteristic data of a resist pattern is obtained by an optical measurement system. The observation data is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position.








 
 
  Recently Added Patents
Single-pass Barankin Estimation of scatterer height from SAR data
Cable sheath
Fuser member
Reliable event broadcaster with multiplexing and bandwidth control functions
Gateway channel utilization
Liquid crystal display device
Remotely provisioned wireless proxy
  Randomly Featured Patents
Non-toxigenic strains of Aspergillus flavus for control of aflatoxin contamination in crops
Method for removing deposit from image substrate and image formation apparatus using the method
Mini blower heat sink module
Circuit and method for measuring PSA output and energy
Scan-bypass architecture without additional external latches
System and apparatus for tracking a person or an animal
Collapsible antenna device
Hydrostatic and active control movable pad bearing
Therapeutic agents for drug dependence
Television receiver with high voltage protection circuit