Resources Contact Us Home
Pressurized liquid diffuser

Image Number 9 for United States Patent #6860279.

The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by "diffusing" pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

  Recently Added Patents
Method for identifying modulators of GPCR GPR1 function
Switchable memory diodes based on ferroelectric/conjugated polymer heterostructures and/or their composites
Circuitry for measuring and compensating phase and amplitude differences in NDT/NDI operation
Flexible circuit routing
Methods and apparatus to determine impressions using distributed demographic information
Sampling switch circuit that uses correlated level shifting
Plasma doping method and plasma doping apparatus
  Randomly Featured Patents
Acoustically transparent visor
Column comprising a base between filler body sections
Module for test device for testing circuit boards
Stator for electric motor
Method of multiplex/demultiplex processing of information and equipment for performing the method
Method for decoding disc information
Substrate treatment apparatus
Bi-domain two-mode single crystal fiber devices
Plastic fastener for detachably mounting a panel on a support member
Non-aqueous electrolyte solutions and non-aqueous electrolyte cells comprising the same