Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Insitu post atomic layer deposition destruction of active species










Image Number 7 for United States Patent #6844260.

Systems and methods for insitu post atomic layer deposition (ALD) destruction of active species are provided. ALD processes deposit multiple atomic layers on a substrate. Pre-cursor gases typically enter a reactor and react with the substrate resulting in a monolayer of atoms. After the remaining gas is purged from the reactor, a second pre-cursor gas enters the reactor and the process is repeated. The active species of some pre-cursor gases do not readily purge from the reactor, thus increasing purge time and decreasing throughput. A high-temperature surface placed in the reactor downstream from the substrate substantially destroys the active species insitu. Substantially destroying the active species allows the reactor to be readily purged, increasing throughput.








 
 
  Recently Added Patents
SONOS stack with split nitride memory layer
Systems and methods for redox flow battery scalable modular reactant storage
Morphinan compounds
Method of operating a split gate flash memory cell with coupling gate
System, method and program recording medium for supply capacity estimation
Pyridyldiamido transition metal complexes, production and use thereof
Method and system for producing fluoride gas and fluorine-doped glass or ceramics
  Randomly Featured Patents
Carton, carton blank and associated methodology
Novel lathering device and razor assembly
Urea derivatives of maleated polyolefins
Image forming apparatus
Arrangement for measuring, checking and control of the position of chosen points of objects with respect to an optical aiming line
Magnetic recording medium
Detachable spool
Process and apparatus for producing chlorinated rubber
Film deposition method
Method of preparing polymers of polyphenylene type