Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Insitu post atomic layer deposition destruction of active species










Image Number 7 for United States Patent #6844260.

Systems and methods for insitu post atomic layer deposition (ALD) destruction of active species are provided. ALD processes deposit multiple atomic layers on a substrate. Pre-cursor gases typically enter a reactor and react with the substrate resulting in a monolayer of atoms. After the remaining gas is purged from the reactor, a second pre-cursor gas enters the reactor and the process is repeated. The active species of some pre-cursor gases do not readily purge from the reactor, thus increasing purge time and decreasing throughput. A high-temperature surface placed in the reactor downstream from the substrate substantially destroys the active species insitu. Substantially destroying the active species allows the reactor to be readily purged, increasing throughput.








 
 
  Recently Added Patents
Shoe
Image forming apparatus, control method of image forming apparatus, and storage medium
Battery power management system and method
Lithographic apparatus and device manufacturing method
Plastic floor-wall transition methods, materials, and apparatus
Image processing apparatus, image processing method, and program
Separate matching models based on type of phone associated with a caller
  Randomly Featured Patents
Wind power installation with separate primary and secondary cooling circuits
Apparatus for film extrusion comprising rotary die parts
Thin film solid oxide fuel cell and method for forming
Use of a polypropylene based composition for expanded beads
Cellular ceramic and foam materials
Anti-theft device
Electromagnetic pilot type directional control valve
Method and apparatus for detecting abnormal state of evaporative emission-control system
Iodinated x-ray contrast media
Symbol synchronizer for software defined communications system signal combiner