Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Insitu post atomic layer deposition destruction of active species










Image Number 7 for United States Patent #6844260.

Systems and methods for insitu post atomic layer deposition (ALD) destruction of active species are provided. ALD processes deposit multiple atomic layers on a substrate. Pre-cursor gases typically enter a reactor and react with the substrate resulting in a monolayer of atoms. After the remaining gas is purged from the reactor, a second pre-cursor gas enters the reactor and the process is repeated. The active species of some pre-cursor gases do not readily purge from the reactor, thus increasing purge time and decreasing throughput. A high-temperature surface placed in the reactor downstream from the substrate substantially destroys the active species insitu. Substantially destroying the active species allows the reactor to be readily purged, increasing throughput.








 
 
  Recently Added Patents
Circuit for compressing data and a processor employing same
Mineral, nutritional, cosmetic, pharmaceutical, and agricultural compositions and methods for producing the same
Method for olympic event hospitality program management
Protein kinase C inhibitors and uses thereof
Code reading apparatus, sales registering apparatus, and sales registering method
Clothes hanger
Leg mounted portable computer
  Randomly Featured Patents
Pressure sensor for a baghouse
Managing sponsored content based on geographic region
Polymer grid for supplemental roof and rib support of combustible underground openings
Compound delivery using impulse transients
Diagnostic system
Process for the selective hydrogenation of chlorine-containing pyrimidines and new pyrimidines
Nail care organizer tray or similar article
Sandal
Novel acyl-polyalkylindan compounds and the use thereof as a base for perfume, as well as perfume compositions
Memory system and method of writing into nonvolatile semiconductor memory