Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method and system of determining chamber seasoning condition by optical emission










Image Number 13 for United States Patent #6825920.

A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.








 
 
  Recently Added Patents
Signal activated molecular delivery
Method of manufacturing crystalline silicon solar cells with improved surface passivation
Systems and methods for advertising on content-screened web pages
Preserving user applied markings made to a hardcopy original document
Techniques for generating and displaying a visual flow of user content through a social network
Laser marking of a card
System and method for solving connection violations
  Randomly Featured Patents
Monoclonal antibodies for diagnosis of hairy cell leukemia
Disc filtration device
Coated sinter of cubic-system boron nitride
Dual channel cardiac pacer isolation circuit
Focusing lens for LED
Magnetic tester
Projector, projection system, and method for generating pixel value in projector
Process controller with power outage analysis capability
Ethylene polymerisation process
Chemical vapor deposition of low density silicon dioxide films