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Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber










Image Number 4 for United States Patent #6807972.

A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.








 
 
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