Resources Contact Us Home
Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber

Image Number 14 for United States Patent #6807972.

A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.

  Recently Added Patents
End to end email monitor
Pulsed plasma with low wafer temperature for ultra thin layer etches
Transactional consistency scheme
Resistor and manufacturing method thereof
Method and apparatus for generating soft bit values in reduced-state equalizers
Mobile device mode control based on dual mapping of availability (presence) information
Methods and systems for automated backups and recovery on multi-os platforms using controller-based snapshots
  Randomly Featured Patents
Method for producing a ferroelectric layer
Depth image generating method and apparatus
High value static unbalance-type balance shafts
Automatic defect detecting/correcting system of tape-mounted electronic components assembly
Process for the endothermic calcination of raw material
Multi-factor authentication using a smartcard
Optimum power management of system on chip based on tiered states of operation
Inflatable dinghy cover
Further-improved control system for solar heating systems