Resources Contact Us Home
Method for fabricating self-aligning mask layers

Image Number 9 for United States Patent #6794259.

A method for fabricating a self-aligning mask layer includes the steps of forming a surface to be masked in a carrier substrate, the surface having different radii of curvature, forming an undensified conformal insulation layer on the surface such that, on account of the different radii of curvature, regions with different mechanical stress are produced in the insulation layer, and carrying out an etching-back to remove partial regions of the insulation layer in a manner dependent on the different mechanical stress in the insulation layer.

  Recently Added Patents
Algorithm for color corrected analog dimming in multi-color LED system
Image sensor pixels with junction gate photodiodes
Verification of computer-executable code generated from a model
Vehicle, toy, and/or replicas thereof
Electrode material and use thereof for production of electrochemical cells
Bad column management with bit information in non-volatile memory systems
Compositions and methods for activating innate and allergic immunity
  Randomly Featured Patents
Valve for the substantially gas-tight interruption of a flow path
Carnation named Londesty
Condensed thiazole compounds and use as pharmaceuticals
Audio component
Capsule-filling machines
Strip printer
Oil pressure auxiliary escape device of elevator
Electromagnetic heating
Electric hand blender
Wide angle zoom lens and image pickup device using the same