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Method for fabricating self-aligning mask layers










Image Number 2 for United States Patent #6794259.

A method for fabricating a self-aligning mask layer includes the steps of forming a surface to be masked in a carrier substrate, the surface having different radii of curvature, forming an undensified conformal insulation layer on the surface such that, on account of the different radii of curvature, regions with different mechanical stress are produced in the insulation layer, and carrying out an etching-back to remove partial regions of the insulation layer in a manner dependent on the different mechanical stress in the insulation layer.








 
 
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