Resources Contact Us Home
Method for fabricating self-aligning mask layers

Image Number 2 for United States Patent #6794259.

A method for fabricating a self-aligning mask layer includes the steps of forming a surface to be masked in a carrier substrate, the surface having different radii of curvature, forming an undensified conformal insulation layer on the surface such that, on account of the different radii of curvature, regions with different mechanical stress are produced in the insulation layer, and carrying out an etching-back to remove partial regions of the insulation layer in a manner dependent on the different mechanical stress in the insulation layer.

  Recently Added Patents
Method for increasing expression of active tumor necrosis factor receptor family member-Ig fusion proteins
Power storage device and method for manufacturing the same
Facility to reuse paper
Stabilization of dicarbonate diesters with protonic acids
System and method for passing PLC signals from a first electrical line to a second electrical line
Provision of downlink packet access services to user equipment in spread spectrum communication network
Flow cytometer method and apparatus
  Randomly Featured Patents
Battery powered flashlight
Suppressed double-sideband communication system
Signal filter assembly with impedance-adjusting characteristic
Waterless lotion and lotion-treated substrate
Method and communication unit for use in a wideband wireless communications system
Portable oxygen reservoir
Image-based compensation and control of photoreceptor ghosting defect
Screen cover retainer strip assembly
Temporal tile staggering for block based video compression
Carpentry work station