Resources Contact Us Home
Gas laser

Image Number 2 for United States Patent #6782030.

The present invention relates to a gas laser with a high-voltage electrode 12 and a ground electrode 14, which electrodes 12, 14 are disposed relative to each other so as to form a discharge gap 16 between them, and with high voltage generating means including a circuit having at least one storage capacitor and at least one secondary capacitor 18, 20, said secondary capacitor 18, 20 being disposed in the area of said high-voltage electrode 12 within a discharge chamber 32 filled with laser gas. Said secondary capacitor 18, 20 includes at least one external surface 28, 28' oriented towards said high-voltage electrode 12 and made of a material which is inert with respect to said laser gas, which external surface 28, 28' forms at least one boundary surface of a flow channel 26, 26' for said laser gas.

  Recently Added Patents
Testing apparatus and testing method for telephone apparatus
Power supply architecture system designer
Method of patterning color conversion layer and method of manufacturing organic EL display using the patterning method
Method and apparatus for power management control of an embedded memory having sleep and shutdown features
User interface for integrating applications on a mobile communication device
Image processing apparatus and image processing method
  Randomly Featured Patents
Load transmitting insert for a soft spline body
Ultrasonic surgical instrument for intracorporeal sonodynamic therapy
4-aryl-4-substituted pyrazolidine-3, 5-dione derivatives
Temperature control apparatus
1,3-thiazoles and their use as immunomodulators
C-terminal modified oxamyl dipeptides as inhibitors of the ICE/ced-3 family of cysteine proteases
Conductive elastomeric contacts and connectors
Method for label-free multiple analyte sensing, biosensing and diagnostic assay
Method and arrangement for varying a voltage occurring between the electrodes of an electrostatic dust separator
Method and apparatus for testing a hall magnetic field sensor on a wafer