Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
System and method for the analysis of biodiesel
Satellite mounting pole
3,7-diamino-10H-phenothiazine salts and their use
Positive electrode active material for nonaqueous electrolyte secondary battery
Side portion of a circular saw blade
Method and system for reciprocal mixing cancellation of wideband modulated blockers
Light emitting element, method for manufacturing the light emitting element, optical element and method for manufacturing the optical element
  Randomly Featured Patents
Barrette mount
Building front rope lift
Alignment fixture and associated method for controllably positioning on optical fiber
Multi-path timing tracking and impairment modeling for improved grake receiver performance in mobility scenarios
Regeneration of ionic liquid catalyst using a regeneration metal in the presence of added hydrogen
Refrigerator having sub door and manufacturing method of sub door
Automated circuit tester
Process for preparing nuclear-fluorinated aromatics
Ultra-wideband radar sensors and networks
Portable removable gun sight