Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for an improved developing process in wafer photolithography










Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.








 
 
  Recently Added Patents
Compositions of quaternary ammonium compounds containing bioavailability enhancers
1,3-diiodohydantoin compound and production method thereof
Hemostatic devices and methods of making same
Wireless communication system, associated methods and data structures
Method for assembling a camera module, and camera module
Dynamic bar oriented user interface
Generator with a segmented stator
  Randomly Featured Patents
System and method of providing computer networking
Hand support for bowling
Virus detection and removal system and method for network-based systems
Compact aircraft wing folding systems and methods
Electric power conversion system and electric power conversion device
Pulse-hyperbolic location system using three passive beacon measurements
Golf ball with polar region uninterrupted dimples
Device which can prevent a pull rod of suitcase from being automatically ejected out
Implant having improved fixation to a body lumen and method for implanting the same
Metering apparatus