Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for an improved developing process in wafer photolithography










Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.








 
 
  Recently Added Patents
Photoacoustic joulemeter utilizing beam deflection technique
Photoelectric conversion apparatus
Reverse mapping method and apparatus for form filling
Simulating non power of two texture behavior
Electromagnetic bandgap structure and printed circuit board
Video processing system and device with encoding and decoding modes and method for use therewith
Systems and methods for detecting and rejecting defective absorbent articles from a converting line
  Randomly Featured Patents
Container
Front portion of a knitted sweater
Lead frame for a multiplicity of terminals
Gaming machine with modified prize feature
Security document and/or a document of value
Sensor arrangement and method for operating a sensor arrangement
Imidazoline derivative, possible tautomer thereof, and vulnerary including such derivative or tautomer
Separation of bi-alkyl substituted monocyclic aromatic isomers
Reversible chair-desk construction
Expert system capable of meeting real time constraints