Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
Correction information calculating device, image processing apparatus, image display system, and image correcting method
Systems and methods for identifying malicious domains using internet-wide DNS lookup patterns
Apparatus and method for scrolling a screen of a portable terminal having a touch screen
Particulate filter with hydrogen sulphide block function
System and method for providing security in browser-based access to smart cards
Wound dressing with a discontinuous contact layer surface
  Randomly Featured Patents
Bipolar FSK digital waveform synthesizer for modem systems
Promotional content kiosk
Swimming aid
Smoked food apparatus
Piezoelectric lighter equipped with a safety lock
Occlusion perfusion catheter
Cable television tap bracket or the like
Malware automated removal system and method
Telecommunications network with heterogeneous operation codings
Method for moving, with at least three degrees of freedom, particularly in theatre area on or below a stage, a complex three-dimensional structure