Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for an improved developing process in wafer photolithography










Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.








 
 
  Recently Added Patents
Portable device for treating insect bites and the like
Three-dimensional holographic display using active shutter
Electrical connector
System and method for controlling device location determination
Positive electrode active material for nonaqueous electrolyte secondary battery
Radio communication system, base station apparatus, terminal apparatus, and radio communication method for radio communication system
Pear-shaped convertible reading glasses
  Randomly Featured Patents
High accuracy survey-grade GIS system
Marking arrangement for aiding aircraft mid-air refueling
Battery charging adapter for a remote monitoring and alarm system
Method of calibrating reflectance measuring devices
System and method for detecting and correcting atrial undersensing
Multi nodal computer system and method for handling check stops in the multi nodal computer system
Residual wastewater chlorine concentration control using a dynamic weir
LAN tester
Apparatus for applying a primer coating with the aid of vacuum
Inter-liner for a safety helmet and method of assembly