Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
Accordion bioreactor
Computer system for routing package deliveries
Train car for proppant containers
Method and apparatus for organizing segments of media assets and determining relevance of segments to a query
Semiconductor device and fabrication method
Universal handle extension for unloading butterfly valve for tank trailer or other vehicle
Modular storage system
  Randomly Featured Patents
System and method for generating a missed approach path
Storage apparatus to which thin provisioning is applied and including logical volumes divided into real or virtual areas
Telephone control system with branch routing
Radioactive magnetic fluids for treatment or diagnosis of cancer, process for preparing them and use thereof
Thermal head method of manufacturing
Display apparatus
Measuring heating value of a gas using flameless combustion
Anti-aging and wound healing compounds
Dual clutch arrangement and method
Assembled shaft and process for production thereof