Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 4 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
Automatic pill dispenser
Reducing energy and increasing speed by an instruction substituting subsequent instructions with specific function instruction
Semiconductor device and manufacturing method thereof
Method and system and policy server for guaranteeing data not to be interrupted
Spark plug
Novelty snacks and method of manufacture of same
Account managing device, image processing system, and storage medium
  Randomly Featured Patents
Nonsubmersible fishing rod and reel
Method and apparatus for setting up tools, work pieces and similar on a rotatable spindle
Coin storage device
Method for the catalytic production of substituted bipyridyl derivatives
Compatibilized carbon black and a process and a method for using
Variable lift valves
External resonant ring cavity for generating high-peak-power laser pulses
Memory media characterization for development of signal processors
Fast chirp transform
Recessed cutting board