Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 3 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
Establishing a multimodal personality for a multimodal application
Method and apparatus for authenticating communication device
Thermal-assisted magnetic recording head capable of supressing the temperature rise of scatterer
Control panel
Browsing or searching user interfaces and other aspects
Method to determine optimal micro-bump-probe pad pairing for efficient PGD testing in interposer designs
Embeded DRAM cell structures with high conductance electrodes and methods of manufacture
  Randomly Featured Patents
Medical device delivery catheter
Inverted meniscus heat pipe
Current generation supply circuit and display device
Method of assembling a hard disk drive
Information processor and data communication control method capable of preventing problems in data communication caused by breakdowns
Visual schedule management system for a manufacturing facility
Wet roll having uniform composition distribution
Flail feedout mechanism for a rotary mower
Wireless communication method and apparatus for managing radio resources using silent measurement periods