Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for an improved developing process in wafer photolithography










Image Number 3 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.








 
 
  Recently Added Patents
Hybrid coatings and associated methods of application
Image pickup device with a plurality of pixels and an AD conversion circuit
Rotation angle detecting device
Illumination unit for a direct-view display
Interface circuit and interface system
System and method for detecting malicious code executed by virtual machine
Escutcheon
  Randomly Featured Patents
Method for telemanipulation with telepresence
Method and arrangement for controlling the metering of fuel in an internal combustion engine
Bistable micromechanical switches
Rendering device selection in a home network
Image forming apparatus
Electric lamp with an anti-reflecting layer
Air treating apparatus and cartridge for such apparatus
Actuating means for separator pawl
Data and event synchronization across distributed user interface modules
Raster scan frame digitizer method and apparatus