Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for an improved developing process in wafer photolithography










Image Number 3 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.








 
 
  Recently Added Patents
Heat transfer label for decorating a metal container
Optical imaging device and imaging method for microscopy
Data management tool
Doherty amplifier circuit
Computerized on-board system for controlling a train
Method and system for the assignment of security group information using a proxy
Cooler
  Randomly Featured Patents
Liquid oxygen compatible biodegradable dye penetrant compositions and method of dye
Carbonator
Read only semiconductor memory having multiple bit cells
Formation of planar dielectric layers using liquid interfaces
Inductor station for sortation conveying system
Means and apparatus for analysing and filtering polarized light and synthesizing a scene in filtered light
Quality management in a data-processing environment
Compensating mechanism for variable speed roll-up door
Event suppression tool for temporarily suppressing actions on received events
Display with compensated light source drive