Resources Contact Us Home
Method for an improved developing process in wafer photolithography

Image Number 3 for United States Patent #6746826.

Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.

  Recently Added Patents
Systems and methods for flow mirroring with network-scoped connection-oriented sink
Markers of acute myeloid leukemia stem cells
360-degree angle decoder
Method of forming an isolation structure
Adjusting dental prostheses based on soft tissue
Braided pull tug pet toy
Multiple carrier compression scheme
  Randomly Featured Patents
Method for stabilizing vinyl chloride polymers
Voltage-controlled oscillator and communication device
Accelerator pedal override for self-propelled motorized cart with aligned brake and accelerator pushrod type operator pedals
Method for production of polyester structures with improved gas barrier property
Surface treatment device for large diameter pipe sections
Key holder
Apparatus for removing film from a film magazine
Colored toner and developer compositions and process for enlarged color gamut
Projector and optical device
Multiple band direct conversion radio frequency transceiver integrated circuit