Resources Contact Us Home
Thin-film forming apparatus and thin-film forming method

Image Number 3 for United States Patent #6723660.

A thin-film forming apparatus of the present invention is capable of reducing variation of film formation rate and forming thin films of a stable thickness. The thin-film forming apparatus can prevent decrease of the film formation rate due to raise of temperatures of an RF electrode and an inner wall of a reaction chamber, by supplying a pressure control gas of a predetermined pressure into the reaction chamber also in non-film formation time to keep a gas pressure in the reaction chamber constant. Thereby, thickness of a film grown on a substrate can be controlled to a constant thickness. Further, by heating the pressure control gas to raise its temperature to a value approximately equal to a temperature of a material gas, variation of the pressure of the gas in the reaction chamber is controlled and the temperatures of the inner wall of the reaction chamber and the RF electrode are kept constant. Thereby, since the film formation rate on the inner wall of the reaction chamber and a surface of the RF electrode are kept constant, the quantity of the material gas substantially supplied to the surface of the substrate is kept constant. Thereby, the film formation rate on the surface of the substrate can be kept constant.

  Recently Added Patents
Editing device and editing method
Cosmetic composition based on a supramolecular polymer and a hyperbranched functional polymer
Reference circuit with curvature correction using additional complementary to temperature component
Agent for expelling parasites in humans, animals or birds
Method for fabricating solar cell
Device and method including a soldering process
Protecting a gaming machine from rogue code
  Randomly Featured Patents
Recessed channel array transistor (RCAT) in replacement metal gate (RMG) logic flow
Pallet/sine plate connector
Polymer-protein surfactants
Device for artificially producing air flow
Base of a lamp stand
Electronic device enclosure having protective layer
Bi-loop heat recovery system
Substituted hydroxy pyridones
Method and apparatus for obtaining high accuracy simultaneous calibration of signal measuring systems