Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
System and method for solving connection violations
Method and apparatus for transmitting and receiving a signal in a communication system
Crystalline form of zofenopril calcium
Organic metal complex and its use in organic electroluminescent device
Electrode structure and its manufacturing method, and semiconductor module
Materials for organic electroluminescent devices containing substituted 10-benzo[c]phenanthrenes
Content reproduction apparatus and content processing method therefor
  Randomly Featured Patents
Semiconductor device comprising a function change over switching circuit having a non-volatile storage device
Steam cleaner
Frequency down-conversion system using arrays of coupled non-linear elements
Resistive memory having shunted memory cells
Method of use of a transport catheter
Tank wagon
Ceric oxide sol
Radiator core
Pen selection mechanism for a printer
Storage stable solid isocyanate compositions, preparation, and method of use thereof