Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Defensin polynucleotides and methods of use
Wiring structure in a semiconductor device, method of forming the wiring structure, semiconductor device including the wiring structure and method of manufacturing the semiconductor device
Method for switching channels in a wireless communication network
Modular sport center
Modular utility rack
Methods for testing OData services
High density molecular memory storage with read and write capabilities
  Randomly Featured Patents
Buckle with a buckle release system
Production of branched hydrocarbons
Image forming apparatus
Heat pump with forced air heating regulated by withdrawal of heat to a radiant heating system
Optical data storage medium
Selection of size of aluminum particles prepared by solution method
Apparatus for producing snow deflecting air curtains for railway switches
Ignition advance correction device
Miniature semiconductor device for surface mounting
Crosslinked polyvinyl alcohol-based polymer membrane and a process of its preparation