Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Engine RPM control device
Treatment of influenza
Inter-carrier communications for multimedia-message delivery
Composite conductive pads/plugs for surface-applied nerve-muscle electrical stimulation
Viewing stand
Method and system for remapping processing elements in a pipeline of a graphics processing unit
System and method for ranking content and applications through human assistance
  Randomly Featured Patents
Method and device for mixing under vacuum mixtures used in dental, goldsmith fields or the like
Direct conversion receiver and receiving method
Money pouch
Data transmission across asynchronous clock domains
Treatment of renal colic with GABA analogs
Solenostemon plant named `TRE RES 08`
Method and apparatus for determining a bit rate need parameter in a statistical multiplexer
Signal break detecting circuit
Image forming apparatus
Method for increasing yield of staple food crop