Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Multichannel device utilizing a centralized out-of-band authentication system (COBAS)
Pharmaceutical compositions of paclitaxel, paclitaxel analogs or paclitaxel conjugates and related methods of preparation and use
System for purifying air through germicidal irradiation and method of manufacture
Probe for ultrasound diagnostic apparatus
Nanoparticle entrapment of materials
Semiconductor device and method of manufacturing the same
Shared system to operationally connect logic nodes
  Randomly Featured Patents
Tower ventilating fan
Battery pack protective circuit for detecting overcharge or wire disconnect
Tin bismuth solder paste, and method using paste to form connection having improved high temperature properties
Method and system for determining billing information in a tag fabrication process
Wheelchair trainer
Semiconductor integrated circuit and high frequency module with the same
Electronic device
Carrier head with a substrate detection mechanism for a chemical mechanical polishing system
Medical device
Process for the production of chlorinated and/or fluorinated propenes