Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Semiconductor device having a multilevel interconnect structure and method for fabricating the same
Secure access to customer log data in a multi-tenant environment
Direct mode adapter based shortcut for FCoE data transfer
Circuitry testing module and circuitry testing device
Stable nanoemulsions for ultrasound-mediated drug delivery and imaging
Antennas and their coupling characteristics for wireless power transfer via magnetic coupling
Specification of latency in programmable device configuration
  Randomly Featured Patents
Cryosurgical spraying apparatus
Combination golf travel bag set
Method and apparatus for endovenous pacing lead
Shock resistant semiconductor device and method for producing same
Aromatic amine curatives and their use
Process for constructing three-dimensional sign character
Compositions and methods for treating hair loss using C.sub.16-C.sub.20 aromatic tetrahydro prostaglandins
Computerized car wash controller system
Detecting global anomalies
Detection of invalid escrow keys