Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 2 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Method and system to proxy phone directories
Disulfide or thiol polymeric hair dyes
Shield and server having the same
Cooling system and method of a fuel cell
Biomass fuel furnace system and related methods
Split-band power amplifiers and duplexers for LTE-advanced front end for improved IMD
DNSSEC inline signing
  Randomly Featured Patents
Multiple valve with automatic sequential operation
Zoom lens system of relatively high zoom ratio ranging to wide angle photography
Storage system
Dynamic allocation of data transmission resources
Speech or audio encoding of variable frequency tonal components and non-tonal components
Method and system for protection of a lithium-based multicell battery pack including a heat sink
Conditional gene vectors regulated in cis
Digital clock
Electrokinetically pumped high pressure sprays
Curved surface forming apparatus, optical scanning apparatus, and image forming apparatus