Resources Contact Us Home
Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice

Image Number 13 for United States Patent #6717651.

An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.

  Recently Added Patents
Refuelable battery-powered electric vehicle
Multicyclic compounds and methods of use thereof
Food safety printer
Digital camera supporting intelligent self-timer mode and method of controlling the same
Medical device arm
Method and system for providing status of a machine
Display stand for a mobile tablet computer
  Randomly Featured Patents
Box-dependent Myc-interacting protein (Bin1) compositions and uses thereof
Method for joining a tip for a flexible shaft and assembly thereof
Apparatus and method for packet based storage virtualization
Information recording medium and reproduction apparatus therefor
Semi-fitted slipcover
Variable capacitance element controllable by a D.C. voltage
Method and apparatus for detecting whether cell coverage is downscaled in wireless communication system
Method and apparatus for inducing hypothermia
Method of making shot from molten siliceous-aluminous composition
Power outlet apparatus with multiple sockets detection, and detection method thereof