Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Method and system for delivering and executing virtual container on logical partition of target computing device
Generating network topology parameters and monitoring a communications network domain
Methods and systems for flicker correction
Floribunda rose plant named `KORamflusa`
Communication system and time synchronization method
High density molecular memory storage with read and write capabilities
Multibranched polymer and method for producing the same
  Randomly Featured Patents
Etching of copper-containing devices
Hydrogen generating apparatus and fuel cell power generation system
Liquid contamination detector
Microelectronic assembly with impedance controlled wirebond and reference wirebond
Multi-function physical training machine
Pipe spinning tool
Regeneration of tidal mud flats
Hoof plate
Semiconductor device and method of embedding bumps formed on semiconductor die into penetrable adhesive layer to reduce die shifting during encapsulation
Rectal insertion device and control valve means therefor