Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Direct connect single layer touch panel
Ventilated vacuum commutation structure
Fluid conduit with PTC fabric heating
Self-service channel marketplace
LED package with top and bottom electrodes
Using rule induction to identify emerging trends in unstructured text streams
Plants and seeds of hybrid corn variety CH336383
  Randomly Featured Patents
Reactive chitosan coated articles and test kit for immunoassay
Scanner document positioning device
Pushbutton radio tuner with illuminated pushbutton display
Method for analyzing address for next generation integrated network service
Method for measuring coating quality
Magnetooptical recording medium
Conveying apparatus
Apparatus for fluid recovery from plurality of wells
Flexible fixture for greeting cards and non-greeting card merchandise
Air compressor and motor combination