Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Dynamic reconstruction of a calibration state of an absorption spectrometer
Sample analysis and/or sample processing system
Method, apparatus, and manufacture for adaptation of video encoder tuning parameters
Asynchronous distributed de-duplication for replicated content addressable storage clusters
Sparse data compression
System, method and apparatus for pausing multi-channel broadcasts
Note tab
  Randomly Featured Patents
Current-mirror circuit with buffering transistor
Edge guiding tape reel
Copy server for collaboration and electronic commerce
Tape loading mechanism for magnetic recording and reproducing devices
End standard for a bench
O'Malley's weapon aiming system
Auditory methods for providing information about a telecommunication system's settings and status
Generation control appparatus for vehicle generators
Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor
Method and system for reconfigurable channel coding