Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Method or system for investing and/or trading
Methods and systems for use in tracking targets for direction finding systems
Stable nanoemulsions for ultrasound-mediated drug delivery and imaging
Determining ill conditioning in square linear system of equations
Nucleic acid sequences encoding strictosidine synthase proteins
System and method for reliable packet data transport in a computer network
  Randomly Featured Patents
Smolder pot with temperature control function
Micro acoustic spectrum analyzer
Method and apparatus for automatically searching desired track position or recording region on information recording medium
Filled dental material based on polymerizable dihydroxy-phenylalanine derivatives
Floating pawl structure providing compound angular yieldability
Polar transmitter
Electronic camera including a display for displaying number of frames
Programmable logic controller
Verification of active nodes in an open network