Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
System and method for associating financial transaction data with a user's project data using a portable electronic device
Automatic misalignment balancing scheme for multi-patterning technology
Integrated circuits with magnetic core inductors and methods of fabrications thereof
Image forming apparatus and method of translating virtual memory address into physical memory address
Process for the production of an acylation catalyst
Portion of a display panel with an unhappy facial expression icon
Clothes hanger
  Randomly Featured Patents
Process for producing a hydrogen-rich gas stream from the effluent of a catalytic hydrocarbon conversion reaction zone
System for real-time game network tracking
Apparatus for winding a wire or thread on C-shaped cores
Liquid flow control assembly
Remote control brand code identification system and method
Locating network echos
H19 silencing nucleic acid agents for treating rheumatoid arthritis
Thin-film transistor and fabrication method thereof
Negative corona shielding of line and station hardware
Phenylacetic acid compounds in treating abnormal platelet aggregation