Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 7 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Mechanical signal processing accumulator attenuation device and method Mesh serving tray Memory device and method of fabricating the same Iodized salt and a process for its preparation Antineoplastic peptides Bat caddy Mobile terminal   Randomly Featured Patents Actuator control device Programmable integrated circuit with voltage domains Preventing simultaneous start of air conditioners during recovery from a power failure Arrangement and method for forming an electrical contact in an electronic device Detergent compositions inhibiting dye transfer Multiple speed hub for a bicycle with centrifugally controlled speed change and override mechanism actuated by back pedaling Operating method for an image-generating medical engineering assembly and articles associated herewith Transfer labeling mechanism for multiple outstanding read requests on a split transaction bus System and method for sequence-based subspace pattern clustering Parts handling machine © 2006-2008 PatentGenius. All Rights Reserved.