Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Distributive data capture
Plants and seeds of hybrid corn variety CH817100
Organic metal complex and its use in organic electroluminescent device
Method and apparatus of communication using soft decision
Fiber optic cables and assemblies for fiber toward the subscriber applications
Permeable pressure sensitive adhesive
Monitoring device for monitoring a display device
  Randomly Featured Patents
Device and method for providing atrial-synchronized ventricular pacing with selective atrial tracking
Multi-cyclone dust collector for vacuum cleaner and vacuum cleaner employing the same
Seal for a cannula assembly
Dragging and dropping objects between local and remote modules
Elliptically shaped magnetic core
Controlled release urea-formaldehyde liquid fertilizer resins with high nitrogen levels
Hybrid slot antennas for handheld electronic devices
Method of connecting network elements to a radio system, and radio system
Invasive lithotripter with focused shockwave
Waveguides for performing spectroscopy with confined effective observation volumes