Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 7 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Detecting mirrors on the web
Apparatus and method for transmitting/receiving data in a communication system
Systems and methods to provide communication history for communication devices
Digital microwave radio link with adaptive data rate
Pet grooming brush and vacuum attachment
Process for the production of electric energy by the excitation and capture of electrons from ground or water sources
Nanofibers containing latent reactive groups
  Randomly Featured Patents
Process for the manufacturing of styrene derivatives, new styrene derivatives and their use as optical brighteners
Optical trigger thyristor and fabrication method
Combination bowling pinspotter and pinspotter control system and method therefor
Petroleum resins and their production with BF3 catalyst
Campanula takesimana plant named `Beautiful Trust`
Test circuit, semiconductor product wafer having the test circuit, and method of monitoring manufacturing process using the test circuit
Video based matching and tracking by analyzing one or more image abstractions
Multiple layer membranes for fuel cells employing direct feed fuels
Method of character recognition
Skating aid