Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Morphinan compounds
Resin composition, prepreg, resin sheet, metal-clad laminate, printed wiring board, multilayer printed wiring board and semiconductor device
Nonvolatile semiconductor memory device
Motion estimation for a video transcoder
Method and system for weighted fair queuing
Case
Nuclear reactor building and construction method thereof
  Randomly Featured Patents
Preparation of polyoxymethylene dimethyl ethers by acid-activated catalytic conversion of methanol with formaldehyde formed by dehydrogenation of methanol
Infusion pump unit
Photographic camera having also function of panoramic photographing
Providing suggested sites associated with target sites
Datadriver and method for conducting driving current for an OLED display
Method for reducing particulate generation from regeneration of cryogenic vacuum pumps
Drive device
Trust-based methodology for securing vehicle-to-vehicle communications
Compound, method for producing the same and method for producing fluoropolymer
Alternator for motor vehicles and manufacturing method thereof