Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Method for modeling and analyzing linear time invariant systems with time delays
Administrable compositions
Sub-resolution assist feature repair
Organic metal complex and its use in organic electroluminescent device
Substituted indolo 4,3 FG quinolines useful for treating migraine
Ventilated vacuum communication structure
Selective high frequency spinal cord modulation for inhibiting pain with reduced side effects, and associated systems and methods
  Randomly Featured Patents
Apparatus and method for assessing exceedance of a process beyond safe operating limits
Atomizer for forming a thin film
Surveillance window
Parcelized geographic data medium with internal spatial indices and method and system for use and formation thereof
Powder skirt zipper system
Insulated tongs for supporting glass sheets during press bending to V shapes and process of use
Method and device for the treatment of headache
Automated system for selecting packages from a storage area
Dual channel frequency synthesizer system
Credit management for data flow between two networks