Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Image processing apparatus, image processing method, and program
Fuel cell and a method of manufacturing a fuel cell
Apparatus and method for layered decoding in a communication system using low-density parity-check codes
Catalyst composition comprising shuttling agent for ethylene multi-block copolymer formation
Portable multimedia player
Electrical conduit containing a fire-resisting thermoplastic composition
Formwork release composition and use thereof
  Randomly Featured Patents
Substrate independent superpolishing process and slurry
Record carrier comprising encryption indication information
Insecticidal coating composition and processes for making and using it
Maximum output level automatic measuring apparatus
Stack-like arrangement of flat objects as well as method and device for forming the arrangement
Method for bleaching discolored teeth
Fluid swivel structure
Light and signal device
Leakage-aware keeper for semiconductor memory
Compositions and methods for delivery of a molecule into a cell