Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Methods and systems to accomplish variable width data input
Reovirus for the treatment of cellular proliferative disorders
Power control arrangement for long term evolution time division duplex method and apparatus
Deflection device for a scanner with Lissajous scanning
Image forming apparatus, control method of image forming apparatus, and storage medium
Electronic device
Processing circuitry for use with a position sensor
  Randomly Featured Patents
Process for tanning leather
Fuser member
Surface light source device and display device
Filling device including a cleaning manifold secured to a dispenser duct
Architecture for a dual segment dual speed repeater
Pressure sensor system
Basting device
Method for using a pre-configured TDM switch and traffic discard to facilitate UPSR selection
Gem-disubstituted and spirocyclic amino pyridines/pyrimidines as cell cycle inhibitors
Holding container for displaying multiple bracelets or watch straps