Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 3 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Method and system for displaying image based on text in image Peptides against autoantibodies causing intolerance to cold and use thereof Bad branch prediction detection, marking, and accumulation for faster instruction stream processing Apparatus, method and system for deep earth grounding Hearing assistive system with low power interface Oral health measurement clamping probe, system and method Modular adaptation and configuration of a network node architecture   Randomly Featured Patents Use of ceramics in dental and orthodontic applications Tire Local terminal search system, filtering method used for the same, and recording medium storing program for performing the method Electromagnetic inductive probe Fluid cooled cabinet for electronic equipment Portable modular indoor/outdoor golf practice apparatus Method and means for reducing the heat consumption in a building or the like Damascene NVRAM cell and method of manufacture Methods for dechlorynation disposal of polyvinyl chloride wastes and apparatus thereof Formulations and methods for treating chronic migraine © 2006-2008 PatentGenius. All Rights Reserved.