Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Piezoelectric device and fabricating method thereof
Electric vehicle supply equipment having a socket and a method of charging an electric vehicle
Bioactive agent-loaded heart-targeting nanoparticles
System and method for associating financial transaction data with user's project data
Particle measurement process and apparatus
Polarity switching member of dot inversion system
Alkaline battery
  Randomly Featured Patents
Protective coating for an electronic device
Food service tray with soup bowl
Set of list for baseball card inventory
Motor module
Multiple-beam optical position sensor for automotive occupant detection
Self-mounting display calendar
Memory cell
Method for interactive segmentation of a structure contained in an object
1,4,7,10-tetraazacyclododecane-1,4-diacetic acid
Odorless or low-odor resinous composition