Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Methods and systems for determining the reliability of transaction
Image sensing apparatus and method of controlling the image sensing apparatus
Image forming apparatus and job request control method instructed by authenticated users
Dual source mass spectrometry system
Focus adjustment unit and optical scanning microscope
Mask blank, transfer mask, and film denseness evaluation method
Optical analysis device, optical analysis method and computer program for optical analysis
  Randomly Featured Patents
Method for treatment of underground reservoirs
Apparatus and method using speech recognition and scripts to capture author and playback synchronized audio and video
Gellan gum sizing
Apparatus and methods for building or drywall tools
Apparatus for the manufacture of continuous coupling elements for slide fasteners
[3.2.0] Heterocyclic compounds and methods of using the same
Routing method
Protection of a safety valve in a subterranean well
High frequency dampening apparatus
Surface configuration of a motorcycle, toy, and/or other replicas