Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Systems and methods for building axes, co-axes and paleo-geographic coordinates related to a stratified geological volume
Die packages and systems having the die packages
SONOS stack with split nitride memory layer
Method for conductivity control of (Al,In,Ga,B)N
Arrays of optical confinements and uses thereof
Flat panel crystal display employing simultaneous charging of main and subsidiary pixel electrodes
Method of fabricating solid electrolytic capacitor and solid electrolytic capacitor
  Randomly Featured Patents
Method and apparatus for serial communications between a host apparatus and optional equipment having unique identification values
On-chip differential multi-layer inductor
Optical communication system with secure key transfer
Scan velocity modulation circuit
Universal derotator for UMTS modes
Golf tee
Positioning table
Lifting station in a surface treatment installation
Structure of stepping motor and method of driving the stepping motor
Hypotensive 3,4-dihydro-2,2-dimethyl-4-amino-2H-benzo[b]pyran-3-ols