Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 3 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Pixel structure of a solid-state image sensor employing a charge sorting method
Radio frequency splitter
Electronic hand-held device
Methods and systems for adapting a user environment
Method and system for implementing power detection
Identifying a characteristic of an individual utilizing facial recognition and providing a display for the individual
Technique for effectively providing program material in a cable television system
  Randomly Featured Patents
Transformer power combiner with filter response
Method for producing a chemical product
Convolution operation circuit
Method for manufacturing silicon carbide MOS semiconductor device including utilizing difference in mask edges in implanting
Method for removing a weak acid from an aqueous solution
Elastomerically mounted hay rake tine
Poly (arylene thioether) block copolymer fibers and production process thereof
Human carbonyl reductase
Hose pliers & method
Flexible forming device for forming three-dimensional shaped workpieces