Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Intraoral camera for dental chairs Low drop-out regulator providing constant current and maximum voltage limit High order continuous time filter Apparatus for merging spatial audio streams Packet bundling at the PDCP layer System and method for storing redundant information Systems and methods for building axes, co-axes and paleo-geographic coordinates related to a stratified geological volume   Randomly Featured Patents Aerosol canister Engine management system Method of estimating mechanical hardness of steel from its magnetic properties System for changing print format Solar energy converter Pop-up target system Apparatus and method for downloading data to electronic device Refrigeration monitor and alarm system Alternating phase shifting masks FIFO-based network interface supporting out-of-order processing © 2006-2008 PatentGenius. All Rights Reserved.