Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Liquid crystal display and method of driving the same Method and system for simulating superimposition of a non-linearly stretchable object upon a base object using representative images Methods and systems for delivering customized advertisements Native NAD-dependent GAPDH replaced with NADP-dependent GAPDH plus NADK High-density fiber optic modules and module housings and related equipment 3D IC method and device Screen   Randomly Featured Patents Sheet feeder and printer Apparatus and method for dispensing vapocoolants Screwdriver Tape cassette loading system for a magnetic recording and reproducing apparatus Hydraulic manifold assembly for variable activation and deactivation of valves in an internal combustion engine Method for producing aromatic alcohols, especially phenol Hookah hose connector Dual-footboard scooter Process for making ethylene glycol Candy container with display © 2006-2008 PatentGenius. All Rights Reserved.