Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus










Image Number 12 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.








 
 
  Recently Added Patents
Methods, systems, and products for searching interactive menu prompting systems
Audio signal clip detection
Display module
Methods and compositions for improving photodynamic therapy through administration of lipids
Method for production of a thermoelectric apparatus
Secure data exchange between data processing systems
Cationic polymers for antimicrobial applications and delivery of bioactive materials
  Randomly Featured Patents
Air flow amount adjusting system for an internal combustion engine
Focusing electrode in electron gun for color cathode ray tube
Cutting apparatus, breaker, contactor, and electrical circuit breaker
Integrated circuit package capable of improving signal quality
Visual processing device, visual processing method, visual processing program, and semiconductor device
Thermoplastic multilayer ethylene polymer sheet for containment of odoriferous product components
Structure of reflux fan for excimer laser apparatus
Apparatus for exposing fibrous reinforcements of fiber reinforced resin body
Zoom lens system
Cement compositions