Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Verification of a portable consumer device in an offline environment (4947 Vending machine Stage drive method and stage unit, exposure apparatus, and device manufacturing method Secure service for enabling communication for calling party when communication service for called party is suspended Pre-colored methodology of multiple patterning Method and apparatus for providing auto-completion of information   Randomly Featured Patents Radiation tomographic imaging apparatus and imaging method using it Ejecting liquid using drop charge and mass Electrical plug connection with a transponder provided in a coding PIN Concealed handcuff key Driving apparatus and exposure apparatus Image defect inspection apparatus Method and apparatus for determining the degree of purity of a liquid Tire tread Heterologous expression of an Aspergillus kawachi acid-stable alpha amylase and applications in granular starch hydrolysis Paper feeder and image forming apparatus using the same © 2006-2008 PatentGenius. All Rights Reserved.