Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 12 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Using sets of OTDR receive fibers with different lengths of marker events to verify optical fiber connectivity
Flat panel display
Calibration of quadrature imbalances using wideband signals
Managing multiple web services on a single device
Device and implantation system for electrical stimulation of biological systems
Optical switching device and communications system
  Randomly Featured Patents
Holder for a scouring implement
Method and apparatus for controlling deflection of a roll
Method for correcting image density in thermo-optic recording
Rapid exchange guidewire mechanism
Control valve unit for solar energy system
High numerical aperture catadioptric objectives without obscuration and applications thereof
Process for purification of crude acetonitrile
Triphenylalkene derivatives
System and method for reconstructing data associated with protected storage volume stored in multiple modules of back-up mass data storage facility
Method of manufacturing phenol by direct oxidation of benzene