Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Integrated history-free and history-based modeling Profile management system including user interface for accessing and maintaining profile data of user subscribed telephony services Boundary-modulated nanoparticle junctions and a method for manufacture thereof Fake exception handler detection Moving picture processing apparatus, moving picture processing method, and program Dynamic, set driven, ribbon, supporting deep merge Electronic weighing device and server system   Randomly Featured Patents Self-healing coupler for a serial raid device Method for carbonizing wastes Process for reducing sheeting during polymerization of alpha-olefins System, method, and apparatus for division coupled with truncation of signed binary numbers Controlled environment chamber apparatus Eccentric drive mechanism Injection nozzle tip cooling Vehicle windshield wiper unit connector Full color surface discharge type plasma display device Match rules to identify duplicate records in inbound data © 2006-2008 PatentGenius. All Rights Reserved.