Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 12 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Emergency whistle, flashlight, and compass
System, method and program product for guiding correction of semantic errors in code using collaboration records
Ranging method and apparatus in passive optical network
Reticle for a riflescope or other projectile-weapon aiming device
Method and apparatus for complementing an instrument panel by utilizing augmented reality
Energy drink package
Washing-up bowl
  Randomly Featured Patents
Pool cleaning system with incremental partial rotating head
Ink manifold with multiple conduit shut off valve
Automatic detection of personal networks
Microbial heteropolysaccharide
Method of manufacturing a two-wing dress-shielding element
Method for continuous casting of steel strands, especially slabs
Adsorbent and process for preparing the same
Desk and wall unit
Elastic surface wave device
Airport taxiway collision alerting system