Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Hydrofluorocarbon refrigerant compositions for heat pump water heaters Recording apparatus, recording method, reproducing apparatus, reproducing method, program, and recording/producing apparatus Recording medium, playback device, integrated circuit Method and apparatus for supporting HARQ Method to trace video content processed by a decoder Method and system for Bluetooth low power link layer connection setup Cascode circuit device with improved reverse recovery characteristic   Randomly Featured Patents Effectuating full duplex digital data transfer Steering column lock .beta.-Halogenoethyl-silanes as plant growth regulators Process for magnetic separation and collection of viable female and male spermatozoa Composition for imparting flame resistance and water repellency to textiles Apparatus for stereoscopically viewing screened images Method for manufacturing a solar cell module by laser bonding Printer Process for the production of homogeneous rubber blanks High-pressure jet ventilation catheter © 2006-2008 PatentGenius. All Rights Reserved.