Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Data processing apparatus including reconfigurable logic circuit Video editing apparatus Fixing device and image forming apparatus Knife grip Dithering method and apparatus Bioelectric battery for implantable device applications Semiconductor memory device and manufacturing method thereof   Randomly Featured Patents Electromagnetic high-frequency apparatus with a transmission wall having antennas Side mount device for multiple foldable furniture packaging and displaying Power transfer system for vehicle with power-Interrupt auto-manual transmission, alternate means for providing torque to driveline, and engine throttle controls Method and system for shaped glasses and viewing 3D images Heavy goods vehicle tire Extended pump-valve-nozzle unit having hydraulic-mechanical translation Process, anchoring member, and clamping device for clamping a rod Maintenance system for an equipment set Liquid crystal display device Switchable particle-based display and method of manufacturing same © 2006-2008 PatentGenius. All Rights Reserved.