Resources Contact Us Home
Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus

Image Number 12 for United States Patent #6716087.

A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

  Recently Added Patents
Hydrofluorocarbon refrigerant compositions for heat pump water heaters
Recording apparatus, recording method, reproducing apparatus, reproducing method, program, and recording/producing apparatus
Recording medium, playback device, integrated circuit
Method and apparatus for supporting HARQ
Method to trace video content processed by a decoder
Method and system for Bluetooth low power link layer connection setup
Cascode circuit device with improved reverse recovery characteristic
  Randomly Featured Patents
Effectuating full duplex digital data transfer
Steering column lock
.beta.-Halogenoethyl-silanes as plant growth regulators
Process for magnetic separation and collection of viable female and male spermatozoa
Composition for imparting flame resistance and water repellency to textiles
Apparatus for stereoscopically viewing screened images
Method for manufacturing a solar cell module by laser bonding
Process for the production of homogeneous rubber blanks
High-pressure jet ventilation catheter