Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Global conference roster for distributed bridges Network connector device Natural language processing method by analyzing primitive sentences, logical clauses, clause types and verbal blocks Implementing vector memory operations Reduce leakage of low-density gas during low-density gas injection into a disk drive Fitting of brightness as a function of current amplitude in a visual prosthesis Adaptive encoding and compression of audio broadcast data   Randomly Featured Patents Silicone oils and solvents thickened by silicone elastomers Scanning optical detection system High lift longitudinal axis control system Methods and systems for eliminating structural modes in a servo mechanism employed to control a flexible structure Dual motherboard computer system Method of and apparatus for locating disturbances in a mineral seam Argyranthemum plant named `Supa538` Control of video decoder for reverse playback operation Method of manufacturing a semiconductor device by crystallization of a semiconductor region by use of a continuous wave laser beam through the substrate Combined adapter and cutter edge unit for excavating, digging or bucket loading shovel © 2006-2008 PatentGenius. All Rights Reserved.