Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus Image Number 12 for United States Patent #6716087. A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.       Recently Added Patents Conversion of 5-(chloromethyl)-2-furaldehyde into 5-methyl-2-furoic acid and derivatives thereof Proton conducting electrolytes with cross-linked copolymer additives for use in fuel cells System and method for managing self-refresh in a multi-rank memory Motor assembly Managing wear leveling and garbage collection operations in a solid-state memory using linked lists Storage apparatus and method including page discard processing for primary and secondary volumes configured as a copy pair Electrode assembly with centrally wound separator member   Randomly Featured Patents Wireless stereo headphone Information converter and a method for transforming information Funnel device for safe disposal of chemical wastes Four channel light system for vehicles Banner material with double grommets Icon for a display screen Data storage medium utilizing directed light beam and near-field optical sources Keratin dyeing compounds, keratin dyeing compositions containing them, and use thereof Method and system for actuating electro-mechanical ribbon elements in accordance to a data stream Servo information write method, data storage device, and programs © 2006-2008 PatentGenius. All Rights Reserved.