Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
System and apparatus for evaluating the effectiveness of wafer drying operations










Image Number 6 for United States Patent #6611326.

Systems and apparatus for evaluating the effectiveness of wafer drying techniques are provided. The systems and apparatus include a laser or any other source configured to apply light radiation to the surface of a substrate that has been rinsed with a solution containing an analytically detectable compound prior to a drying process. Any residue of the analytically detectable compound is excited by the source, and the resulting energy is imaged with a confocal microscope or similar device to identify regions of the surface of the substrate of ineffective drying.








 
 
  Recently Added Patents
Methods for diagnosing irritable bowel syndrome
Method and system for a low-power client in a wide area network
Polyolefin and composition for pipe systems and sheets
Automatic actuator for breakers or switches
System and method for providing dynamic navigation through a property to a selected destination
(Meth)acrylic resin composition, imidized (meth)acrylic resin composition, and film obtained by molding them
Position and orientation measurement apparatus, position and orientation measurement method, and storage medium
  Randomly Featured Patents
Remotely configured media device
Mitotic inhibitors preventing posterior lens capsule opacification
Distributing shared network access information in a shared network mobile communications system
Barrier system
Generating array bit-fail maps without a tester using on-chip trace arrays
Assembly for applying a fluid behaviour substance, in particular for envelopes of letters provided with a closure strip
Ceramic tile burner
Window air conditioner adjustable brace
Electronic computer
Process for producing L-amino acid oxidase