Resources Contact Us Home
System and apparatus for evaluating the effectiveness of wafer drying operations

Image Number 6 for United States Patent #6611326.

Systems and apparatus for evaluating the effectiveness of wafer drying techniques are provided. The systems and apparatus include a laser or any other source configured to apply light radiation to the surface of a substrate that has been rinsed with a solution containing an analytically detectable compound prior to a drying process. Any residue of the analytically detectable compound is excited by the source, and the resulting energy is imaged with a confocal microscope or similar device to identify regions of the surface of the substrate of ineffective drying.

  Recently Added Patents
Integrated circuit devices having conductive structures with different cross sections
Automatic portable electronic device configuration
Method of hydrothermal liquid phase sintering of ceramic materials and products derived therefrom
Code conversion apparatus, code conversion method, and computer product
System and method for leveraging independent innovation in entertainment content and graphics hardware
System and method for combined I/Q generation and selective phase interpolation
System and method for logical separation of a server by using client virtualization
  Randomly Featured Patents
Coffee spray head
Induction heating coupler
System and apparatus for servicing equipment
Water based emulsion copolymers incorporating vinyl ethylene carbonate
Route precomputation method and apparatus for bandwidth guaranteed traffic
Bicyclic sulfonamide derivatives
Microfabricated implantable wireless pressure sensor for use in biomedical applications and pressure measurement and sensor implantation methods
Pressure fluid actuator
Ball-and-socket joint
Engine control equipment and its air meter