Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
In-situ monitoring of linear substrate polishing operations










Image Number 3 for United States Patent #6585563.

A substrate polishing scheme (apparatus and method) is described according to which a polishing surface of a polishing sheet is driven in a generally linear direction by a drive mechanism, a surface of a substrate is held against the polishing surface of the polishing sheet by a polishing head, and the substrate is probed through the polishing sheet by a monitoring system.








 
 
  Recently Added Patents
Distributive data capture
Navigation device, navigation method, and navigation program
Device and method incorporating an improved text input mechanism
Power saving methods for wireless systems
Light emitting device
Method and system for imaging a cross section of a specimen
Antimicrobial flush solutions
  Randomly Featured Patents
Apparatus and method of converting reciprocating motion to rotary motion
Gear mechanism and reduction planetary gear
Operating apparatus for switching device
Multi-level-cell trapping DRAM
Automated DSL performance adjustment
Dispensing apparatus
Applicator
Mo-Cu Composite powder
Capping of polyphenylene ether resin
Color solid state image pickup element with plural photocells of a same color within a subunit thereof controlled by a common control line and outputting to a common signal line