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Designing integrated circuits to reduce electromigration effects










Image Number 3 for United States Patent #6578178.

A method of designing an integrated circuit calculates the current density in each metal lead. The method can calculates a mean time to failure for at least one metal lead. The method can assume the metal leads are arranged in series only. The method can calculate the reliability of the integrated circuit. The method can arrange the set of metal leads by reliability. The method can divide the set of metal leads into at least two subsets, a subset requiring redesign and a subset meeting the reliability criteria. An embodiment includes an integrated circuit designed by the method taught. An embodiment includes a computer program product according to the method taught. An embodiment includes an integrated circuit including an integrated circuit designed according to the computer program product.








 
 
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