Resources Contact Us Home
Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures

Image Number 8 for United States Patent #6391502.

The present invention involves a photolithographic process, and apparatus and material for use therein, for producing etched or eroded areas or holes in a selected pattern on or in the surface of fine workpieces, such as small diameter tubes. One aspect of the present invention is a photolithographic process for producing a selected pattern on a nonplanar surface of a workpiece using at least one mask to define the selected pattern. The process includes the acts of applying a photoresist material to the workpiece and aligning the mask with the nonplanar surface of the workpiece. The mask may have an inner surface that corresponds to the nonplanar surface. The process may also include the acts of exposing and developing the photoresist material.

  Recently Added Patents
Rose plant named `Esm R068`
Method for measuring and improving organization effectiveness
Expression of dirigent gene EG261 and its orthologs and paralogs enhances pathogen resistance in plants
Semiconductor device
Primed stem cells and uses thereof to treat inflammatory conditions in joints
Methods and apparatus for ultrasonic cleaning
Coreference resolution in an ambiguity-sensitive natural language processing system
  Randomly Featured Patents
Hysteresis mechanism for a torque variation absorbing device
Infant neonatal pulse oximeter sensor
Riser isolation tool
Semiconductor device and protection method
Garment hanger
Image resolution adjustment method
Monostable ferroelectric active matrix display
Buffer bypass for quick data access
Novel polymeric compounds containing piperidine groups
MOS type semiconductor device having electrostatic discharge protection arrangement