Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing










Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.








 
 
  Recently Added Patents
Opioid-ketamine and norketamine codrug combinations for pain management
Reverse mapping method and apparatus for form filling
Playback device for stereoscopic viewing, integrated circuit, and program
Display module
Fluorescent dyes, fluorescent dye kits, and methods of preparing labeled molecules
Method for driving electrophoretic display device, electrophoretic display device, and electronic device
Squib control circuit
  Randomly Featured Patents
Herpoxin: herpes virus inhibitor and method
Hoisting device
Process for reducing the level of objectionable flavors in vegetable protein by microorganism contact
Process for increasing the water retention capacity in fibrous webs
Asymmetrical universal serial bus communications
Blends of poly(arylene sulfide) and copoly(arylene sulfide) modified with diphenyl ether
Disposable absorbent articles with masking topsheet having one or more openings providing a passageway to a void space
Reflexive teleoperated control system for a remotely controlled vehicle
Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
Display device for projector and method of making and using a display device