Resources Contact Us Home
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing

Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.

  Recently Added Patents
Horizontal aggregations in a relational database management system
Soliciting first party in communication session to maintain call when degradation of connection to second party is anticipated
Data portal for concurrent assessment
Method of patterning color conversion layer and method of manufacturing organic EL display using the patterning method
Surface emitting laser device, surface emitting laser array, optical scanning device, and image forming apparatus
Semiconductor device having a bonding pad and shield structure of different thickness
  Randomly Featured Patents
Parabolic control of the duty cycle of a pulse width modulated signal
Process for producing .beta.-hydroxyester
Method and apparatus for reducing the lock time of DLL
Merchandise display shelf
Paper conveying mechanism including a device for altering the direction of the paper
Drive transmission apparatus for twin-screw extruder
Biologically active polypeptides based on transforming growth factor-.beta.
Ladder rack for mounting on the side of a truck
Apparatus and method for securing digital data with a security token
Method of making electrophotographic member