Resources Contact Us Home
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing

Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.

  Recently Added Patents
Dithering method and apparatus
Method and apparatus for efficiently inserting fills in an integrated circuit layout
Device with a floating head having a heater element
Automatic population of feature capabilities on a communication device
Backside structure and methods for BSI image sensors
Method and apparatus for communications
Wind turbine
  Randomly Featured Patents
Ergonomic visual display system
Process for the preparation of urethane resins and urethane resin compositions
Image pickup apparatus and recording method
Process for preparing a single phase Bi-containing superconducting thin oxide film by laser ablation
Use of isoflavonoids in the treatment or prevention of postpartum depression
Display screen having amorphous silica microspheres with fluorescence behavior
4-(Phenyl-(piperidin-4-yl)-amino)-benzamide derivaties and their use for the treatment of pain, anxiety or gastrointestinal disorders
Socket wrench extension structure
Intermediary network system and method for facilitating message exchange between wireless networks
Heating and handling system for metal consolidation process