Resources Contact Us Home
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing

Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.

  Recently Added Patents
Apparatus for electrographic printing or copying
Method and system for physical verification using network segment current
Generating wiki pages from content and transformation objects
Generation, display, and manipulation of measurements in computer graphical designs
Automated dynamic differential data processing
Starch networks as absorbent or superabsorbent materials and their preparation by extrusion
Method and system for an integrated host PCI I/O bridge and dual port gigabit ethernet controller
  Randomly Featured Patents
Method for treating substrates for microelectronics and substrates obtained by said method
Hosta plant named `Aquamarine`
Generational garbage collector with persistent object cache
Process and apparatus for catalytically reacting a reducing gas and water vapor
Valve pin and method of manufacture
Wall base with curved back face
Portable computer keyboard
Combination poncho and cushion
System for detecting operating parameters of an electric household appliance featuring a relatively movable component
Methods of determining the level of human TBP-II with anti-TBP-II antibody