Resources Contact Us Home
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing

Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.

  Recently Added Patents
Electronic component
Display device and projector
Character input device and program for displaying next word candidates based on the candidates' usage history
Parasitic element compensation circuit and method for compensating for the parasitic element
Method for conformal plasma immersed ion implantation assisted by atomic layer deposition
Enhancement of semiconducting photovoltaic absorbers by the addition of alkali salts through solution coating techniques
Power converter for an LED assembly and lighting application
  Randomly Featured Patents
Machine control apparatus and method
Methods and systems to enhance multiple wave mixing process
Asymmetric four-transistor SRAM cell
Retaining wall system
High-energy detector
Seat belt device for vehicle
Method and systems to interface navigation operations
Flexible vented self-sealing dispensing valve
Collapsible hand truck
On-line auction sales leads