Resources Contact Us Home
System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing

Image Number 4 for United States Patent #6375348.

A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.

  Recently Added Patents
Methods and apparatus for intelligent selection of goods and services in mobile commerce
Signal processing and tiered signal encoding
Connector with shielding device and method for manufacturing connector
Device to facilitate moving an electrical cable of an electric vehicle charging station and method of providing the same
Peptides useful in the treatment and/or care of skin, mucous membranes, scalp and/or hair and their use in cosmetic or pharmaceutical compositions
System and method for providing a path avoidance feature in a network environment
Chemically resistant membranes, coatings and films and methods for their preparation
  Randomly Featured Patents
Anhydrous cosmetic compositions comprising at least one polymeric gelling agent, at least one non-volatile oil, and poly(methyl methacrylate) particles
Epoxy resin composition and curing product thereof
Electrochemical cells
Separation system employing degassing separators and hydroglyclones
Fuel injector with abrupt and stable termination
Horn driver
Pressure cooker
Manufacturing method of semiconductor device
Mobile phone
Particulate mass measuring apparatus