Resources Contact Us Home
Plasma treatment system

Image Number 15 for United States Patent #6322662.

In a plasma treatment system, the increase of the electric field of a treatment space facing the central portion of a flat antenna member is relieved, and the ununiformity of the density of plasma in a plasma forming region is relieved.Microwave generated by a microwave generator 50 are supplied from a waveguide 52 to a flat antenna member 44. The flat antenna member 44 has a plurality of slots 60. The space between adjacent two of the slots 60 is longer than the guide wavelength of microwaves in the waveguide 52, and the length of each of the slots 60 is shorter than half of the guide wavelength. The slots 60 are arranged in a region other than the central portion of the flat antenna member 44 so as not to be axisymmetric.

  Recently Added Patents
High order continuous time filter
Method and apparatus for interactive distribution of digital content
Data center with free-space optical communications
Compositions substantially free of sodium chloride and methods for the storage of red blood cells
Cable preparation tool
Change management automation tool
Light-emitting device package and method of manufacturing the same
  Randomly Featured Patents
Recording system having a coating device for coating recording medium or photosensitive medium with developer material reacting with color precursor
Molded resin product and process for surface treatment thereof
Alcohol reactants for forming phenylpyrimidine derivatives and process for preparing said alcohols
Appliance for protecting against the effects of explosive devices
Information storage medium and electronic device using the same for authentication purposes
Hydraulic power transducer
Method and apparatus for detecting orientation of downhole geophones
Bit line precharging and equilibrating circuit
Non-intrusive monitoring of quality levels for voice communications over a packet-based network
Hand-drying apparatus with rotating towel support