Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method to solve the dishing issue in CMP planarization by using a nitride hard mask for local inverse etchback and CMP










Image Number 5 for United States Patent #6261923.

A method for forming planarized isolation using a nitride hard mask and two CMP steps is described. A first nitride layer is deposited over a pad oxide layer on the surface of a semiconductor substrate. The first nitride and pad oxide layers are etched through where they are not covered by a mask to provide at least one wide opening and at least one narrow opening where the surface of the substrate is exposed. Trenches are etched into the substrate where it is exposed. An oxide layer is deposited overlying the first nitride layer and within the trenches completely filling the narrow trench wherein a trough is formed over the wide trench. A second nitride layer is deposited over the oxide layer. The second nitride layer is polished away with a polish stop at the oxide layer whereby the second nitride layer is removed except: where it lies within the trough. The oxide layer is etched back where it is not covered by the second nitride layer wherein the oxide layer is planarized except where the oxide layer underlies the second nitride layer. The second nitride layer is removed within the trough whereby oxide horns forming the trough extend vertically upward from the planarized oxide surface. Thereafter, the oxide layer is polished away with a polish stop at the first nitride layer whereby the oxide horns are removed. The first nitride and the pad oxide layers are removed completing formation of the shallow trench isolation.








 
 
  Recently Added Patents
Optimized control of an energy supplying system and an energy consuming system
Serving base station selection based on backhaul capability
Thermoplastic resin composition
Method of providing tailor-made software for hospital departments
Adjustable box extender
Systems and methods for processing telephone calls
Volume compensation within a photovoltaic device
  Randomly Featured Patents
Tri-square protractor
Frame structure
Optical amplifier repeater
Fluid ejection device
Method of applying heat insulating material to sheet metal
Kniphofia plant named `Elvira`
Process for the preparation of 2-aryl-1,3-propanediols
Method and apparatus for determining usage of digital signal processing resources
Ester derivative and use thereof
Transfer transistor of CMOS image sensor