Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Semiconductor device and method for producing the same










Image Number 14 for United States Patent #6218299.

For example, in a plasma processing system, C.sub.4 F.sub.8 gas and C.sub.2 H.sub.4 gas are introduced as film-forming gases at flow rates of 60 sccm and 30 sccm, respectively, under the conditions of a pressure of 0.2 Pa, a microwave power of 2.7 kW, a radiofrequency power of 1.5 kW, and a wafer temperature of 350.degree. C. At the same time, a plasma gas is also introduced at a flow rate of 150 sccm to form CF film 13 having an F content of, for example, 22% on silicon substrate 11. This CF film 13 has a relative dielectric constant of 2.4.








 
 
  Recently Added Patents
Tag-based apparatus and methods for neural networks
Translation system adapted for query translation via a reranking framework
Magnetic disk and manufacturing method thereof
Adaptive contact window wherein the probability that an answering user/expert will respond to a question corresponds to the answering users having response rates that are based on the time of
Reliability fire pressure switch
Mobile camera localization using depth maps
Entropy encoding and decoding using direct level and run-length/level context-adaptive arithmetic coding/decoding modes
  Randomly Featured Patents
Method for production of protein food products or protein food materials in paste state and method for the production of food products from these materials
Surgical clip applier
Wire placing device
Sheet material cutting table
Dishwasher
Pointing position detection device, presentation system, and method, and computer-readable medium
Flashlight holster
Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel
Luggage bag with collapsible inner frame and wheels
Means for closing the seam of a rolled dough body