Resources Contact Us Home
Cobalt salicidation method on a silicon germanium film

Image Number 14 for United States Patent #6214679.

A method of forming a cobalt germanosilicide film is described. According to the present invention a silicon germanium alloy is formed on a substrate. A cobalt film is then formed on the silicon germanium alloy. The substrate is then heated to a temperature of greater than C. for a period of time less than 20 seconds to form a cobalt germanium silicide film.

  Recently Added Patents
Device for determining the absolute angular position of the steering wheel of an electric power-assisted steering column of a motor vehicle using weighted dynamic parameters of the vehicle
System and method for determining a characterisitic of an object adjacent to a route
System and method for identifying a target signal in an optical transport network frame structure
Thermoplastic fluoropolymer composition
Display fixture for highlighting products
Liquid crystal display device
  Randomly Featured Patents
Multi-purpose container attached to a harness
Hinge connection
Method and apparatus for providing a time-division multiplexing (TDM) interface among a high-speed data stream and multiple processors
Image forming system, an apparatus, and method for controlling the same
Semiconductor die with high density offset-inline bond arrangement
Fixing structure of back cover for watch
System and method for using generic utilities to perform database utilities on mainframe operated DB2 databases
Electrical connector assembly with connection assist
Skateboard wheel or similar article
Dual personalized watercraft