Resources Contact Us Home
Substrate washing apparatus and method

Image Number 11 for United States Patent #6175983.

The substrate washing apparatus of the present invention comprises a film scrub member permeable to liquid, which is moved relatively to a substrate held substantially horizontally while being in contact with the substrate, a supporting portion for supplying the film scrub member, a supply pipe for supplying a cleaning liquid to the substrate through the film scrub member, cleaning liquid supply means for supplying the cleaning liquid to the supply pipe, pressing means for pressing the film scrub member supplied with the cleaning liquid and swollen, to the substrate, and relative moving means for horizontally moving the film scrub member supplied with the cleaning liquid and swollen, relative to the substrate.

  Recently Added Patents
Generating and using checkpoints in a virtual computer system
Towel clip
Optical analysis device, optical analysis method and computer program for optical analysis
Therapeutic human anti-IL-1R1 monoclonal antibody
Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon population
Transferases and oxidoreductases, nucleic acids encoding them and methods for making and using them
  Randomly Featured Patents
Begonia plant named `Peggy`
Treating gases with liquids
Systems and methods for compressing and distracting vertebrae of the spinal column
Friction-free bistable device for use in space application, in particular for closing an aperture of a space application optical instrument
Method of manufacturing a moulded article and a product of the method
Distance measuring device using position sensitive light detector
Synthesis of MBE-based coded speech using regenerated phase information
Locking device for a moving anchor of a seat belt
Dispersant additives
Family of linear antimicrobial peptides from hagfish intestine