Resources Contact Us Home
Self-cleaning etch process

Image Number 9 for United States Patent #6136211.

A process for etching a substrate 25 in an etching chamber 30, and simultaneously cleaning a thin, non-homogeneous, etch residue deposited on the surfaces of the walls 45 and components of the etching chamber 30. In the etching step, process gas comprising etchant gas is used to etch a substrate 25 in the etching chamber 30 thereby depositing etch residue inside the chamber 30. Cleaning gas is added to the process gas for a sufficient time and in a volumetric flow ratio that is sufficiently high, to react with and remove substantially all the etch residue deposited by the process gas. The present method advantageously cleans the etch residue in the chamber 30, during the etching process, and without use of separate cleaning, conditioning, and seasoning process steps.

  Recently Added Patents
Implantable medical devices including elongated conductor bodies that facilitate device and lead configuration variants
Reducing voltage stress in a flyback converter design
Use of physical deformation during scanning of an object to generate views of the object
Storage apparatus and method including page discard processing for primary and secondary volumes configured as a copy pair
Communication apparatus, and method and program for controlling same
Polypeptides and immunizing compositions containing gram positive polypeptides and methods of use
  Randomly Featured Patents
Thermal interface adhesive and rework
Near chip size integrated circuit package
Method for depolymerization of rubber
Process for production of aluminum hydroxide from ore containing alumina
Patient positioning device of a panoramic dental X-ray apparatus
Microwave magnetron-type device
Semi-transmissive liquid crystal display panel
Corrosion sensors
Drive system for a variable diameter tilt rotor
Electronic testing device for a microprocessor