Resources Contact Us Home
Self-cleaning etch process

Image Number 5 for United States Patent #6136211.

A process for etching a substrate 25 in an etching chamber 30, and simultaneously cleaning a thin, non-homogeneous, etch residue deposited on the surfaces of the walls 45 and components of the etching chamber 30. In the etching step, process gas comprising etchant gas is used to etch a substrate 25 in the etching chamber 30 thereby depositing etch residue inside the chamber 30. Cleaning gas is added to the process gas for a sufficient time and in a volumetric flow ratio that is sufficiently high, to react with and remove substantially all the etch residue deposited by the process gas. The present method advantageously cleans the etch residue in the chamber 30, during the etching process, and without use of separate cleaning, conditioning, and seasoning process steps.

  Recently Added Patents
Method and system for modeling a common-language speech recognition, by a computer, under the influence of a plurality of dialects
Method and system for cooling of integrated circuits
Over the counter medicinal container with surface ornamentation
System and method for performing image correction
Methods for isolating ligands of the human bitter taste receptor TAS2R49
Code reading apparatus, sales registering apparatus, and sales registering method
Liquid crystal display device with a control mechanism for eliminating images
  Randomly Featured Patents
Cleaning cart
Piezo solenoid actuator and valve using same
Apparatus and method for programming voltage protection in a non-volatile memory system
Method of connecting cables
Electro-optic apparatus, driving method for the same, and electronic appliance
Seam line marker
Laser marking system
Vehicle shift control apparatus
Ternary boride product and process
Use of nabumetone or 6-methoxynaphthyl acetic acid for the treatment of dementia