Resources Contact Us Home
Self-cleaning etch process

Image Number 12 for United States Patent #6136211.

A process for etching a substrate 25 in an etching chamber 30, and simultaneously cleaning a thin, non-homogeneous, etch residue deposited on the surfaces of the walls 45 and components of the etching chamber 30. In the etching step, process gas comprising etchant gas is used to etch a substrate 25 in the etching chamber 30 thereby depositing etch residue inside the chamber 30. Cleaning gas is added to the process gas for a sufficient time and in a volumetric flow ratio that is sufficiently high, to react with and remove substantially all the etch residue deposited by the process gas. The present method advantageously cleans the etch residue in the chamber 30, during the etching process, and without use of separate cleaning, conditioning, and seasoning process steps.

  Recently Added Patents
Etching apparatus and methods
Method for using a super-slippery thin layer characterized by the method for making same
Polyureas made from aminocrotonates and enaminones
Electrode and method for manufacturing the same
Method of operating an election ballot printing system
Image forming apparatus detecting color patterns and generating interleaf images at predetermined position
Semiconductor light-receiving device
  Randomly Featured Patents
Stub-shaft powered spinning tiller
Electronic apparatus and starting method of the electronic apparatus
Organic electroluminescent device and method of driving the same
Recombinant herpesvirus of turkeys comprising a foreign DNA inserted into a non-essential region of the herpesvirus of turkeys genome
Compressing memory management in a device
Stack of bags each having congruent cutouts and perforated lines
Prosthetic tubular article
Punch stripper
Proxy cache technology
Matrix assisted pulsed laser evaporation direct write