Resources Contact Us Home
Method for forming cornered images on a substrate and photomask formed thereby

Image Number 14 for United States Patent #5959325.

A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.

  Recently Added Patents
Wafer level packaging structure with large contact area and preparation method thereof
Multi user MIMO detection utilizing averaged spatial whitening
Backlight assembly, method for driving backlight assembly, and liquid crystal display having the same
Field of view matching in a visual prosthesis
Electrical event detection device and method of detecting and classifying electrical power usage
Method to quantify siRNAs, miRNAs and polymorphic miRNAs
Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks
  Randomly Featured Patents
Cleaning pad for vacuum cleaner
Rotary cylinder and automatic collect holder
Detection and ranging device and detection and ranging method
Adaptive actuator system
Device for positioning and contacting test contacts
Begonia plant named `Monella`
Method of fabricating bubble-type micro-pump
Dipole tunable reconfigurable reflector array
Active data type variable for use in software routines that facilitates customization of software routines and efficient triggering of variable processing
Verbena plant named `Radverb`