Resources Contact Us Home
Method for forming cornered images on a substrate and photomask formed thereby

Image Number 14 for United States Patent #5959325.

A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.

  Recently Added Patents
Voltage detecting device for LED driver
System and method for providing restrictions on the location of peer subnet manager (SM) instances in an infiniband (IB) network
Sparse network almanac
Cosmetic/dermatological compositions comprising naphthoic acid compounds and polyurethane polymers
Potato cultivar F10
Optical input device
Nitrogen-doped carbon-supported cobalt-iron oxygen reduction catalyst
  Randomly Featured Patents
Varying bandwidth digital signal detector
Process for manufacturing a silicon semiconductor device having a reduced surface recombination velocity
Combination urine meter and drainage receptacle
Union peeling device
Light gun having selectable modulated infrared output
Pyrido [2,3-D]pyrimidines for inhibiting protein tyrosine kinase mediated cellular proliferation
Apparatus and method for guiding vehicle autonomously
Method and system for symmetric memory population
Semiconductor memory device having a ferroelectric memory capacitor