Resources Contact Us Home
Method for forming cornered images on a substrate and photomask formed thereby

Image Number 14 for United States Patent #5959325.

A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.

  Recently Added Patents
Sealing member for piezoelectric resonator device, and piezoelectric resonator device
Data communication system, data transmitting apparatus, data transmitting method, and method for determining packet size and redundancy
Evolutionary clustering algorithm
Shoe upper
Extreme ultraviolet light source device and method for generating extreme ultraviolet light
Display screen or portion thereof with icon
FET device having ultra-low on-resistance and low gate charge
  Randomly Featured Patents
Fuel-water separator
Farmhouse sink
Investment cast airfoil core/shell lock and method of casting
Receptacle dumping apparatus and method
Scroll-type fluid machine with configured wrap edges and grooves
Scraper-protector for use with garbage disposal unit
Method of manufacturing folded capacitors in semiconductor and folded capacitors fabricated thereby
N-Phosphono methylene amino alkane phosphonic acid compounds, process of producing same, and method and compositions of using same
Computer aided process for network analysis
Ink washing device for a printing machine