Resources Contact Us Home
Method for forming cornered images on a substrate and photomask formed thereby

Image Number 14 for United States Patent #5959325.

A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.

  Recently Added Patents
Wind energy system having a connection protection device
High sensitivity stress sensor based on hybrid materials
Hermetically sealed atomic sensor package manufactured with expendable support structure
Rupture resistant system
Graphical planner
System and method for order placement in an electronic trading environment
Integrated multi-sat LNB and frequency translation module
  Randomly Featured Patents
Pharmaceutical compositions containing dyclonine HC1 and phenol
Automatic choke and starting aid for small two-cycle internal combustion engines
Method of making a heat sink
Combined cycle system for optimizing cycle efficiency having varying sulfur content fuels
Low oil food composition and method
Method for making tissue sheets on a modified conventional wet-pressed machine
Antenna for receiving VLF/LF transmission in seawater
Range count and main memory address accounting system
Electromagnetic inductive probe
Decorative heat texturing process for plastic pieces