Resources Contact Us Home
Semiconductor device and manufacturing method thereof

Image Number 12 for United States Patent #5864161.

A method of manufacturing a semiconductor device includes the steps of forming an insulating film on a silicon region of a substrate having the silicon region on a surface the insulating film having an opening for forming an exposed region of the silicon region, supplying a gas containing a halogen onto the silicon region, and supplying a source gas of silicon onto the silicon region, thereby selectively depositing the silicon on the exposed region of the silicon region.

  Recently Added Patents
Optimization of packaging sizes
Case of electronic device having antenna pattern embedded therein and mold and method for manufacturing the same
Wireless device with extendable antenna
Bluetooth headset
PEGylated, extended insulins
Glycosyltransferase promoter
Estrogen receptor ligands
  Randomly Featured Patents
NMR Sodium images
Electrical contact and connector
Text searching system
Process for the preparation of aryloxyacetic acid
Aging-related circulating particle-associated lipoprotein B oxidase (apoBNOX) and inhibitors thereof
Sensor chip with magnetoresistive wheatstone bridges for determining magnetic field directions
Precision, airborne deployed, GPS guided standoff torpedo
Method of controlling elements used to execute elementary functions of an internal combustion engine
Process for manufacturing polyester copolymers
Lathe tool assembly