Resources Contact Us Home
Semiconductor device and manufacturing method thereof

Image Number 12 for United States Patent #5864161.

A method of manufacturing a semiconductor device includes the steps of forming an insulating film on a silicon region of a substrate having the silicon region on a surface the insulating film having an opening for forming an exposed region of the silicon region, supplying a gas containing a halogen onto the silicon region, and supplying a source gas of silicon onto the silicon region, thereby selectively depositing the silicon on the exposed region of the silicon region.

  Recently Added Patents
Method and device for processing broadcast packets/multicast control messages
Deposition apparatus and method for manufacturing organic light emitting diode display using the same
Camera with monitor
Intermediate film for laminated glasses, and laminated glass
Wireless monitoring in process applications
Rose plant named `ESM R044`
  Randomly Featured Patents
System and method using edge processing to remove blocking artifacts from decompressed images
Electrophoretic processes for the selective deposition of materials on a semiconducting device
Blend of polyethylene and polypropylene
Polycarbonate-polyurethane dispersions for thromobo-resistant coatings
System and method for simulation and modeling of biopharmaceutical batch process manufacturing facilities
Method of attaching rail pulls to existing kitchen or bathroom cabinets having previously installed knobs or pulls
Digital synthesizer
Cargo hold floor for a cargo hold of an aircraft and method for the installation thereof
Liquid crystal display systems
Optical coating and lamp employing same