Resources Contact Us Home
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement

Image Number 17 for United States Patent #5844247.

There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optical system by means of scanning the mask and the substrate synchronously relative to the projection optical system. The method comprises the steps of providing a plurality of measuring marks on the mask formed along a relative scanning direction, and providing a plurality of reference marks formed on the stage corresponding to the measuring marks, respectively, moving the mask and the substrate synchronously in the relative scanning direction to measure successively a displacement amount between the measuring marks on the mask and the reference marks, and obtaining a correspondence relation between a coordinate system on the mask and a coordinate system on the stage according to the displacement amount.

  Recently Added Patents
Image processing apparatus, image display apparatus, and image processing method
Therapeutic human anti-IL-1R1 monoclonal antibody
SMS transport resource control
Method for forming contact in an integrated circuit
Method and device for operating a vehicle having a hybrid drive
Air driven alternators for battery powered vehicles
Complete context search system
  Randomly Featured Patents
Wind turbine providing reduced radio frequency interaction and related methods
Method for avoiding bucking oscillations during acceleration of vehicles
Method for treating intervertebral discs
Polyester plasticizer
Exhaust gas purification apparatus of internal combustion engine and catalyst for purifying exhaust gas internal combustion engine
Bi-directional liquid sample handling system
Suction cup clamp assembly
Heat-sensitive record material
High density connector with enhanced structure
Method for making twin tub CMOS devices