Resources Contact Us Home
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement

Image Number 17 for United States Patent #5844247.

There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optical system by means of scanning the mask and the substrate synchronously relative to the projection optical system. The method comprises the steps of providing a plurality of measuring marks on the mask formed along a relative scanning direction, and providing a plurality of reference marks formed on the stage corresponding to the measuring marks, respectively, moving the mask and the substrate synchronously in the relative scanning direction to measure successively a displacement amount between the measuring marks on the mask and the reference marks, and obtaining a correspondence relation between a coordinate system on the mask and a coordinate system on the stage according to the displacement amount.

  Recently Added Patents
Methods to fabricate a photoactive substrate suitable for microfabrication
Social network user data advertising
System and method for organizing, processing and presenting information
Method of and apparatus for recording motion picture, which generate encoded data with higher compression efficiency using a motion vector similarity
Use of natural query events to improve online advertising campaigns
Systems and method for automatic color plane misregistration calibration
  Randomly Featured Patents
Fluted arrow
Furnace and method with sensor
Polymer compositions for intraluminal stent
Method of positioning articles in predetermined relationships and fixture therefor
Working line
Flower pot cover
Carrier system for ski equipment
Spring locked disassembly folding knife