Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inductive plasma reactor










Image Number 14 for United States Patent #5811022.

A plasma reactor and methods for processing semiconductor wafers are described. Gases are introduced into a reactor chamber. An induction coil surrounds the reactor chamber. RF power is applied to the induction coil and is inductively coupled into the reactor chamber causing a plasma to form. A split Faraday shield is interposed between the induction coil and the reactor chamber to substantially block the capacitive coupling of energy into the reactor chamber which may modulate the plasma potential. The configuration of the split Faraday shield may be selected to control the level of modulation of the plasma potential. For etch processes, a separate powered electrode may be used to accelerate ions toward a wafer surface. For isotropic etching processes, charged particles may be filtered from the gas flow, while a neutral activated species passes unimpeded to a wafer surface.








 
 
  Recently Added Patents
Bread basket
Door-activated entry light fixture
Electrode tab for secondary battery and secondary battery using the same
Probe for ultrasound diagnostic apparatus
Regulating a supply voltage provided to a load circuit
Extensible framework for client-based active network measurement
Cosmetic product including vegetable oil blend
  Randomly Featured Patents
Wireless communication system with selectively sized data transport blocks
Rack-and-pinion type steering apparatus with pressure equalization system
Pedometer
Device and method of monitoring dampening and inking equilibrium in offset printing units
Methods of wireless communication
Pillow cushion and seat having the same
Cleaning composition for medical instrument
System and method for noise suppression
Calibrachoa plant named `Sunbelriki`
Hydroconversion process using a sulfided molybdenum catalyst concentrate