Resources Contact Us Home
Pad conditioner

Image Number 6 for United States Patent #5779526.

Polishing apparatus cuts and shapes a polishing pad to produce a polishing surface which minimizes pad runout and which can be contoured to better achieve desired polishing rates, pressures, and performance with respect to selected areas on a semiconductor wafer being processed with the polishing pad.

  Recently Added Patents
Puncture resistant fabric
Replacing memory pointers with implicit pointers to be used in compiler-generated debug output
Method and system for modeling a common-language speech recognition, by a computer, under the influence of a plurality of dialects
Modified binding proteins inhibiting the VEGF-A receptor interaction
Data distribution unit for vehicle entertainment system
Wiring structure in a semiconductor device, method of forming the wiring structure, semiconductor device including the wiring structure and method of manufacturing the semiconductor device
Crosslinked core/shell polymer particles
  Randomly Featured Patents
Shoe sole with twist flex feature
Method and apparatus for speech encoding and decoding by sinusoidal analysis and waveform encoding with phase reproducibility
Piston ring apparatus
Method and device for detecting an object in a vehicle in particular for occupant protection systems
System for accessing a large number of menu items using a zoned menu bar
MRI vertical magnet apparatus and MRI apparatus
Wall-mountable rack for wine bottles
Valve train for internal combustion engine
LED driver circuit
Display device wherein a gate insulating film provided at one TFT is thinner than a gate insulating film provided at another TFT, and a gap between a pixel electrode and a counter electrode is