Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Measurement of the mobile ion concentration in the oxide layer of a semiconductor wafer










Image Number 4 for United States Patent #5773989.

A method and apparatus for measuring the concentration of mobile ions in the oxide layer of a semiconductor wafer from the contact potential shift caused by ion drift across the oxide that includes depositing charge (e.g., using a corona discharge device) on the surface of the oxide and heating the wafer to allow mobile ions in the oxide (especially Na.sup.+) to drift. The difference in the contact potential measured before and after heating provides an indication of the mobile ion concentration in the oxide layer.








 
 
  Recently Added Patents
Thermoforming sheet loading apparatus and method
Methods of modulating interleukin-22 and immune response by notch regulators
Creation and use of test cases for automated testing of media-based applications
Shoe bag
Sperm factor sequences
Light-emitting element, light-emitting device, and electronic device
Terminal and method of controlling the same
  Randomly Featured Patents
Methods and apparatus for characterizing polynucleotides
Adhesive with variable adhesivity
Video processing apparatus and controlling method for same
Direct voltage multiplier capable of being integrated into a semiconducting structure
Suspension board with circuit
Gelation of water soluble polymers
Polymers having oxidic functionality and derivatives thereof
Device with a laser for image presentation
Resource estimation for design planning
Rotary bearing assembly