Resources Contact Us Home
Method to form self-aligned gate structures and focus rings

Image Number 5 for United States Patent #5653619.

A selective etching and chemical mechanical planarization process is employed for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays. The process is employed to construct an emission grid whereby the gate structure is capable of producing a field strength at the cathode tip sufficient to generate electron emission. The gate is disposed at a location above the tip such that the gate physically intercepts the outermost lateral portions of the beam, yet does not induce a significant electrostatic outward divergence of the beam, thereby reducing the cross-section of the beam.

  Recently Added Patents
Fabrication of thin pellicle beam splitters
Mounting structure, electro-optical apparatus, and touch panel
Acoustic reconfiguration devices and methods
Hand sign
Optical disc drive having a tray for loading a disc using supporting portions
Tailoring the band gap of solar cells made of liquid silane by adding germanium
Method of monitoring and configuring
  Randomly Featured Patents
Process for the oxidation of polyethylene waxes
Use of VLCFAE for identifying herbicidally active compounds
Side channel compressor
Heterobifunctional monomers and uses therefor
Accumulator for conveyor system
New glycopeptide antibiotic
Digging or gripping tool
Electric power tool with improved speed change gearing
Computer server
Control of solid-state image sensor