Resources Contact Us Home
Method to form self-aligned gate structures and focus rings

Image Number 5 for United States Patent #5653619.

A selective etching and chemical mechanical planarization process is employed for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays. The process is employed to construct an emission grid whereby the gate structure is capable of producing a field strength at the cathode tip sufficient to generate electron emission. The gate is disposed at a location above the tip such that the gate physically intercepts the outermost lateral portions of the beam, yet does not induce a significant electrostatic outward divergence of the beam, thereby reducing the cross-section of the beam.

  Recently Added Patents
Data transfer operation completion detection circuit and semiconductor memory device provided therewith
Spark plug
Hair motion compositor system for use in a hair/fur pipeline
Emulsions containing arylboronic acids and medical articles made therefrom
Pet urn enclosure
  Randomly Featured Patents
Methods and apparatus for collecting, storing, processing and using network traffic data
Retractable needle device
Handle for traffic delineator
Single-wire carrier edge protector trim strip
Loudspeaker with motional feedback
Magnetic mounting platform
Method of line laying for mooring a platform
Cookie cutter
Test system with high frequency interposer
Disaster recovery in a networked computing environment