Resources Contact Us Home
Method to form self-aligned gate structures and focus rings

Image Number 5 for United States Patent #5653619.

A selective etching and chemical mechanical planarization process is employed for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays. The process is employed to construct an emission grid whereby the gate structure is capable of producing a field strength at the cathode tip sufficient to generate electron emission. The gate is disposed at a location above the tip such that the gate physically intercepts the outermost lateral portions of the beam, yet does not induce a significant electrostatic outward divergence of the beam, thereby reducing the cross-section of the beam.

  Recently Added Patents
Process for producing .beta.-sialon fluorescent material
Method of transmitting and receiving a paging message in a mobile communication system
Plasma panel based radiation detector
Pyridyldiamido transition metal complexes, production and use thereof
Isolated nucleic acid molecule encoding an antibody that reduces GDF-8 activity
Rear bumper for an automobile
  Randomly Featured Patents
Multimedia system and method for remote monitoring or refereeing in dart machines
Apparatus, method, and computer product for image processing
Packaged unit for brushes
Pool skimmer
Rapid particle agglutination test for enterotoxigenic bacteria
Method for cleaning and drying an industrial part
Single receiver wireless tracking system
Ink-jet recording apparatus with environmental temperature based drive-signal generation
Systems and methods for an adaptive bias circuit for a differential power amplifier
Saving and retrieving data based on public key encryption