Resources Contact Us Home
Method for rinsing wafers adhered with chemical liquid by use of purified water

Image Number 6 for United States Patent #5651836.

A method for rinsing wafers having residual chemical liquid adhering thereto with purified water is disclosed which is characterized by the steps of preparing a rinsing tank provided in the upper part thereof with an overflow discharge part for spent rinsing liquid and a head tank disposed above the rinsing tank, storing purified water for rinse in the head tank, setting in place in the rinsing tank a basket having a plurality of wafers stowed therein parallelly as suitably spaced in such a manner that the surfaces of the wafers may lie substantially vertically, feeding the purified water from the headtank to the rinsing tank by virtue of head, causing the purified water to flow upward from below the basket, and enabling the spent rinsing liquid to be discharged through the overflow discharge part in an amount equivalent to part or the whole of the purified water fed from the head tank.

  Recently Added Patents
Liquid crystal shutter glasses
Radio transmitter and radio receiver with channel condition assessment
Contactless electrical connector for an induction sensor, and sensor including such a connector
Image forming apparatus
Method of forming solderable side-surface terminals of quad no-lead frame (QFN) integrated circuit packages
Virtual appliance update method
Packet bundling at the PDCP layer
  Randomly Featured Patents
Memory controller and memory system including the same having interface controllers generating parity bits
Semiconductor laser device
Method for dispensing material onto a substrate
Method for conditioning the intake air of a supercharged, low-compression ratio diesel engine
Device for transporting fragile objects, and in particular blood bags
Football helmet popcorn maker
Network traffic analysis using a flow table
Mode-locking and chirping system for lasers
Apparatus for fitting shrunk on-foil hoods into recessed portions of a multi-layered stack
Liquid ejecting apparatus and method for adjusting positions of nozzle rows