Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for rinsing wafers adhered with chemical liquid by use of purified water










Image Number 6 for United States Patent #5651836.

A method for rinsing wafers having residual chemical liquid adhering thereto with purified water is disclosed which is characterized by the steps of preparing a rinsing tank provided in the upper part thereof with an overflow discharge part for spent rinsing liquid and a head tank disposed above the rinsing tank, storing purified water for rinse in the head tank, setting in place in the rinsing tank a basket having a plurality of wafers stowed therein parallelly as suitably spaced in such a manner that the surfaces of the wafers may lie substantially vertically, feeding the purified water from the headtank to the rinsing tank by virtue of head, causing the purified water to flow upward from below the basket, and enabling the spent rinsing liquid to be discharged through the overflow discharge part in an amount equivalent to part or the whole of the purified water fed from the head tank.








 
 
  Recently Added Patents
Adapter plate for use in mounting an audio/visual device or the like to a surface
Power-saving receiver
High order continuous time filter
Boring machine
Scalable architecture for rank order filtering
Method and system for migrating object update messages through synchronous data propagation
Garden tool handle
  Randomly Featured Patents
System for removing contaminants from storm water
Endovascular graft coatings
Animal chew toy
Apparatus and a method for clean-in-place for a semi-frozen food dispensing machine
Coating thickness and wedge geometry control for magnetic disks
Optical apparatus
Avalanche semiconductor amplifier
Roller shell hard coating
Debris cage
Cationic aqueous bituminous emulsion-aggregate slurries preparation