Resources Contact Us Home
Stationary focus ring for plasma reactor

Image Number 2 for United States Patent #5552124.

A stationary focus ring for use in a plasma reactor during wafer processing includes a first slotted opening through which a wafer transfer blade and wafer may pass, and includes a second slotted opening, where the two openings cooperate to provide a balanced gas flow distribution across the wafer surface, such that process uniformity is achieved across the wafer surface, while minimizing the actual size of the openings to provide an increased level of reaction commensurate with that of a solid, movable focus ring. Alternatively, a thick focus ring that displaces chamber volume and thereby stabilizes gas flow within the chamber has a circular, an eccentric, and/or a baffle configuration to provide uniform gas flow distribution across the wafer surface.

  Recently Added Patents
Method for transitioning between Ziegler-Natta and metallocene catalysts in a bulk loop reactor for the production of polypropylene
Heteroleptic iridium complexes as dopants
Semiconductor device having a multilevel interconnect structure and method for fabricating the same
Authenticating and off-loading IPTV operations from mobile devices to fixed rendering viewing devices
Method and system for evaluating/analyzing patent portfolio using patent priority approach
Bad column management with bit information in non-volatile memory systems
Methods and compositions for inhibition of neutrophil exocytosis
  Randomly Featured Patents
Method and apparatus for monitoring layer erosion in a dry-etching process
Waterfowl decoy with stabilizing buoyancy attachment
Method for the pre-baking treatment of chunk of frozen bread dough
Cathode assembly for electrolytic aluminum reduction cell
Selective synthesis of mercaptans and catalyst therefor
Filter housings
Pair of binoculars
Hydrophilic treatment of pigments
Stator of reciprocating motor
Portable refrigerant recycling unit for heat exchange with separate recovery unit