Resources Contact Us Home
Micro-miniature structures and method of fabrication thereof

Image Number 5 for United States Patent #5364742.

In the fabrication of a free-standing miniaturized structure in a range of about 10 to 20 .mu.m thick, a method based on a sacrificial system includes the steps of selecting a substrate material, depositing on the substrate material a sacrificial layer of material and patterning the sacrificial layer to define a shape. A photoresist layer of material is deposited on the sacrificial layer and patterned by contrast-enhanced photolithography to form a photoresist mold. Upon the mold there is plated a metallic layer of material. The electroplated structure conforms to the resist profile and can have a thickness many times that of conventional polysilicon microstructures. The photoresist mold and the sacrificial layer are thereafter dissolved using etchants to form a free standing metallic structure in a range of about 10 to 20 .mu.m thick, with vertical to lateral aspect ratios of 9:1 to 10:1 or more.

  Recently Added Patents
Bipolar junction transistor with a self-aligned emitter and base
Range extension techniques for a wireless local area network
Linerless labels
Transducer displacement protection
Method and system for remapping processing elements in a pipeline of a graphics processing unit
Mobile terminal and method for displaying information
Flame-proofed thermoplastic compositions
  Randomly Featured Patents
Analysis of carrier ampholytes using immobilized pH gradients
Apparatus and method for automated creation of resource types
Nozzle structure of a lawn sprinkler
Flexible space structure construction connector for variably sized building elements
Microprocessor and data processing system for data transfer using a register file
Assays to predict atherosclerosis and dysfunctional high-density lipoprotein
Distributed earcon local area network
Porous structures
Nanostructured electrode for a microbattery
Permanent magnet rotor with complete amortisseur