Resources Contact Us Home
Micro-miniature structures and method of fabrication thereof

Image Number 5 for United States Patent #5364742.

In the fabrication of a free-standing miniaturized structure in a range of about 10 to 20 .mu.m thick, a method based on a sacrificial system includes the steps of selecting a substrate material, depositing on the substrate material a sacrificial layer of material and patterning the sacrificial layer to define a shape. A photoresist layer of material is deposited on the sacrificial layer and patterned by contrast-enhanced photolithography to form a photoresist mold. Upon the mold there is plated a metallic layer of material. The electroplated structure conforms to the resist profile and can have a thickness many times that of conventional polysilicon microstructures. The photoresist mold and the sacrificial layer are thereafter dissolved using etchants to form a free standing metallic structure in a range of about 10 to 20 .mu.m thick, with vertical to lateral aspect ratios of 9:1 to 10:1 or more.

  Recently Added Patents
Maize variety inbred PH1CD7
Particulate filter with hydrogen sulphide block function
Single-pass Barankin Estimation of scatterer height from SAR data
Display apparatus, a method for a display control, and program
Method and system for distributing ringback files
Method and system for video parameter analysis and transmission
Methods, systems and apparatus for displaying the multimedia information from wireless communication networks
  Randomly Featured Patents
Wall lamp
Loom speed controller responsive to filling yarn characteristics
Ultrasonic wire bonding apparatus and method
Combustion-electric laser
Substituted phenols as stabilizers
Tightly-coupled GNSS/IMU integration filter having calibration features
Variable capacity pump/motor
Method for restoring bulkiness of nonwoven fabric
Comparator having reduced offset voltage
Video metadata correction apparatus and method