Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 9 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Semiconductor IC including pulse generation logic circuit
Performance monitoring of advanced process control systems
Pattern data conversion for lithography system
Gestures for presentation of different views of a system diagram
Systems, methods, and media for firewall control via remote system information
Antibodies to Clostridium difficile toxins
Block polymers and their process of preparation
  Randomly Featured Patents
Method for the manufacture of a tempered and/or curved glass pane with reduced transmission
Socket for integrated circuit component
Combined alpha-numeric keyboard and display module for a communication system or similar article
Tunable vertical-cavity surface-emitting laser with tuning junction
Reattachment of tissue to base tissue
Systems and methods for filling a collapsible container
Pharmaceutical cream with reduced imiquimod impurities at four months using refined oleic acid
Axle final drive assembly
System for storing and retrieving a personal-transportation vehicle
Semiconductor device having a region of a material which is vaporized upon exposing to ultraviolet radiation