Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 9 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Home appreciation participation notes
Controller with screen
Adaptive frame scanning scheme for pulsed X-ray imaging
Methods and apparatus for determining a phase error in signals
Portable communication terminal, communication method and control program
Method of adenoviral vector synthesis
Device for installing conducting components in structures
  Randomly Featured Patents
Method and system for controlling the photolithography process
Apparatus and method for generating VLIW, and processor and method for processing VLIW
Computer system for managing orders for and deliveries of goods
Non-volatile storage with metal oxide switching element and methods for fabricating the same
Apparatus for sizing and finishing batches of lumber
Sample rate converter having distributed filtering
Hydropneumatic spring suspension device for vehicles
Power factor corrected rectification
Fuel pump for automobile
Optical trap