Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 9 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Illumination unit for a direct-view display
Storage system comprising multiple microprocessors and method for sharing processing in this storage system
Etch resistant clearcoat
Distortion compensation device, distortion compensation method, and radio transmitter
Methods and systems for adapting a user environment
Block copolymer nanoparticle compositions
Wideband multi-channel receiver with fixed-frequency notch filter for interference rejection
  Randomly Featured Patents
Microporous fluorinated silica agglomerate and method of preparing and using same
Apparatus for use in an interconnection system
Apparatus and method for injecting a liquid dye into a polymer melt
Electromagnetic valve driving apparatus for driving a valve of an internal combustion engine
Method of making a lithographic printing plate with an ink jet fluid material
Sleeve cuff presser of shirt sleeve press
Apparatus and process for vibratory finishing of parts
Method and system for providing an improved store-in cache
Portable concession stand
Wireless system for monitoring and reacting to events at a remote location