Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 9 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Myoglobin blooming agents, films, packages and methods for packaging
System and method for performing image correction
Invisible fence battery charger
Optical article comprising a temporary anti-fogging coating with improved durability
Monitoring heap in real-time by a mobile agent to assess performance of virtual machine
Semiconductor overlapped PN structure and manufacturing method thereof
Stable nanoemulsions for ultrasound-mediated drug delivery and imaging
  Randomly Featured Patents
Image-forming device and printing apparatus incorporating the device as well as image-forming method therefor
Seat sliding device for vehicle
Method of volume-panorama imaging processing
Method of and device for spontaneously distilling off secondary substances especially from oily liquids
Methyl methacrylic coatings on thermoplastic substrates
Cast housing encased CATV power supply unit
Device and method for loading and unloading a heat treatment furnace
Hybrid solar cells with thermal deposited semiconductive oxide layer
Organic photoreceptor, process cartridge, image forming apparatus, and image forming method
Radio apparatus and radio receiving method