Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 6 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Method, apparatus, and system for synchronizing contents
Method for transitioning between Ziegler-Natta and metallocene catalysts in a bulk loop reactor for the production of polypropylene
Information processing apparatus and display control method
Tone enhancement bracket
Toy
Dual source mass spectrometry system
High porosity ceramic honeycomb article containing rare earth oxide and method of manufacturing same
  Randomly Featured Patents
Vehicular run controlling apparatus and method for automotive vehicle
Software application recreation
Capacitor gain-boost circuit
Water-permeable solid material and manufacturing method therefor
Dishwasher and method for operating a dishwasher
Compliant buoyancy can guide
Crumple element comprising a guiding mechanism
Data recording and reproducing apparatus and phase locked loop circuit for use therein including D/A converters acting as charge pumps and a reference voltage source
Dispensers for fluent masses with enhanced sealing and latching
Process for producing grain oriented silicon steel sheets having excellent magnetic properties