Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Nonselective germanium deposition by UHV/CVD Image Number 6 for United States Patent #5286334. A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.       Recently Added Patents Photosensor assembly and method for providing a photosensor assembly Fast-scanning SPM scanner and method of operating same Semiconductor light emitting device and method for manufacturing the same Bacteriophage strains for the treatment of bacterial infections, especially drug resistant strains of the genus Enterococcus [1]benzothieno[3,2-B][1]benzothiophene compound and method for producing the same, and organic electronic device using the same Reducing the size of a high resolution profile lookup table Combined bearing and rotary machine   Randomly Featured Patents Semiconductor device using low-K material as interlayer insulating film and its manufacture method Method of immediate writing or reading files on a disc like recording medium Compounds which selectively modulate the CB2 receptor High temperature protective coating Method of manufacturing imprint substrate and imprinting method Power regulator circuit Magnetic snap fastener Combination bipolar forceps and scissors instrument Support element for a finger lever of a valve gear of an internal combustion engine Information storage system for converting data at transfer © 2006-2008 PatentGenius. All Rights Reserved.