Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 6 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
System and method for optimizing teams
Hook
Method and system for modifying satellite radio program subscriptions in a mobile vehicle
Modification of an object replica
Production of battery grade materials via an oxalate method
Methods of preventing and treating viral infections by inhibiting the deISGylation activity of OTU domain-containing viral proteins
Sensor controller, navigation device, and sensor control method
  Randomly Featured Patents
Propylene polymers
Organic electroluminescent device and display apparatus
Toy gun
Process for producing a high temperature-resistant structure with application of lubricant
Semiconductor memory and method for driving the same
Ranked cleaning policy and error recovery method for file systems using flash memory
Rotary tilling and grass cutting device
Lighthouse
Cores providing reduced spindle clearance for core wound paper products
Adjustable handle with air hole and control valve