Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nonselective germanium deposition by UHV/CVD










Image Number 6 for United States Patent #5286334.

A method of depositing Ge on a Si substrate in a reaction chamber includes the steps of: precleaning the substrate; evacuating the chamber to a pressure below 10.sup.-7 Torr; heating the substrate to 300.degree.-600.degree. C.; and providing a GeH.sub.4 /B.sub.2 H.sub.6 /He mixture of gas with a GeH.sub.4 partial pressure of 2-50 mTorr and a B.sub.2 H.sub.6 partial pressure of 0.08 to 2 mTorr.








 
 
  Recently Added Patents
Event-triggered server-side macros
Method of inspecting wafer
Conductive polymer and a solid electrolytic capacitor using the same as a solid electrolyte
Gaming machine certificate creation and management
Door-activated entry light fixture
Tint block image generation program and tint block image generation device
Cosmetic composition based on a supramolecular polymer and a hyperbranched functional polymer
  Randomly Featured Patents
Capacitive weighing device
Inflatable jumper
Lounge chair
Umbrella with an integral anchoring structure
Device for selectively filtering under reduced pressure and for vacuum drying sample liquids or drops of sample liquids as well as use of said device
Storage tank de-inventorying
Electron beam exposure apparatus employing blanking aperture array
Mobile track tamping machine with lifting and lining equipment
Auxiliary orthodontic appliance
Per pin circuit test system having N-bit pin interface providing speed improvement with frequency multiplexing