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Photo-mask for manufacture of two-layer tab










Image Number 7 for United States Patent #5284725.

Disclosed are photo-masks for use in two exposure steps to be effected for forming a ground metal layer on the back surface of a substrate in manufacture of a two-layer: TAB in which a metal layer is formed on one surface or both surfaces of an insulating resin substrate without an adhesive, determined metal leads are formed on the top surface of the substrate, via holes are formed on the determined positions of the substrate, a ground metal layer is formed on the back surface of the substrate, and a part of the leads as formed on the top surface of the substrate are electrically connected with the ground metal layer as formed on the back surface of the same via the via holes; the photo-masks being characterized in that the photo-mask to be used in the first exposure step for forming the via holes to the back surface of the substrate is provided with alignment marks in the determined plural positions thereof and that the photo-mask to be used in the second exposure step for forming the ground metal layer on the back surface of the substrate is provided with alignment marks in the positions corresponding to the positions of the alignment marks made in the first photomask.








 
 
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